Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya; Hideyuki Ochiai; Yoshinobu Watabe; Keisuke Ishida; Hiroyuki Masuda; Youichi Sasaki; Takahito Kumazaki; Akihiko Kurosu; Takeshi Ohta; Kouji Kakizaki; Takashi Matsunaga; Hakaru Mizoguchi

doi:10.1117/12.2046128

31 March 2014 Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 9052, Optical Microlithography XXVII; 90522E (2014) https://doi.org/10.1117/12.2046128
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Gigaphoton has developed a new monitoring system that provides shot-level light source performance data to FDC systems during exposure time. The system provides basic monitoring data (e.g. Energy, Wavelength, Bandwidth, etc.) and beam performance data, such as Beam Profile, Pointing, Divergence, Polarization can also be monitored using a new metrology tool called the Beam Performance Monitor (BPM) module. During exposure time the system automatically identifies the start and end timing of the wafer and each shot based on the burst of firing signals from the scanner, and stores the measured data in sequence. The stored data is sorted by wafer or by shot, and sent to REDeeM Piece which in turn converts the data to the user's protocol and send it to the FDC system. The user also has the option to directly view or download the stored data using a GUI. Through this monitoring system, users can manage light sources data at the shot or reticle level to facilitate optimization of performance and running cost of the light source for each process. This monitoring system can be easily retrofitted to Gigaphoton's current ArF laser light sources. The beam splitter of the BPM was specially designed to bend only a small fraction of the source beam, so we are able to simply install the BPM without the need for special optical alignment.

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Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, and Hakaru Mizoguchi "Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes", Proc. SPIE 9052, Optical Microlithography XXVII, 90522E (31 March 2014); https://doi.org/10.1117/12.2046128

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