Defect reduction by using point-of-use filtration in a new coater/developer

Toru Umeda; Shuichi Tsuzuki; Toru Numaguchi

doi:10.1117/12.813662

1 April 2009 Defect reduction by using point-of-use filtration in a new coater/developer

Toru Umeda, Shuichi Tsuzuki, Toru Numaguchi

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 72734B (2009) https://doi.org/10.1117/12.813662
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The impact of pore size and membrane material polarity on the effectiveness of point-of-use filtration is evaluated here. Decreased pore size and increased polarity in membrane materials were confirmed to positively influence the effectiveness of microbridge defect removal by a point-of-use filter in the LITHIUS Pro^TM coater/developer system. Comparative analysis of different solvent systems validates a model of competitive adsorption whereby morehydrophilic solvents and gel-like agglomerates preferentially interact with the Nylon 6,6 membrane surface. This suggests that adsorption is the dominant mechanism for microbridge defect removal via filtration. Therefore, utilizing filtration products built around polar membrane materials (like hydrophilic Nylon 6,6) will result in greater microbridge defect reduction than solely reducing filter pore size.

Citation Download Citation

Toru Umeda, Shuichi Tsuzuki, and Toru Numaguchi "Defect reduction by using point-of-use filtration in a new coater/developer", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72734B (1 April 2009); https://doi.org/10.1117/12.813662

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