I. C. Edmond Turcu,1 Chris M. Mann,1 Sung W. Moon,2 B. J. Maddison,1 Ric M. Allott,1 Nicola Lisi,1 Syed Ejazu Huq,1 Nam Seong Kim3
1Rutherford Appleton Lab. (United Kingdom) 2Rutherford Appleton Lab. (UK) and Kumho Institute of Science and Technology (South Korea) 3Rutherford Appleton Lab. (UK) and Kumho Information and Telecommunication Lab. (South Korea)
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Fabrication of 3D terahertz waveguide components is demonstrated using a novel x-ray micromachining process with integral and embedded x-ray masks. 1 nm x-rays generated by a laser-plasma source are used to expose chemically amplified resist. A repeated exposure and development technique shortens the total x-ray exposure time to 10 min to obtain the required 48 micrometers high structures. A 2.5 THz waveguide cavity is fabricated in gold by electroplating the above resist microstructure.
I. C. Edmond Turcu,Chris M. Mann,Sung W. Moon,B. J. Maddison,Ric M. Allott,Nicola Lisi,Syed Ejazu Huq, andNam Seong Kim
"X-ray micromachining of deep 3D terahertz waveguide components using a laser plasma source at 1-nm wavelength", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.284000
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I. C. Edmond Turcu, Chris M. Mann, Sung W. Moon, B. J. Maddison, Ric M. Allott, Nicola Lisi, Syed Ejazu Huq, Nam Seong Kim, "X-ray micromachining of deep 3D terahertz waveguide components using a laser plasma source at 1-nm wavelength," Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.284000