Mr. Akihiro Yamada Profile

Akihiro Yamada

at Canon Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 1 April 2008 Paper

Optimization procedure of exposure tools with polarization aberrations

Tadashi Arai, Akihiro Yamada, Kenichiro Mori, Yoshinori Osaki, Toshiyuki Yoshihara, Yasuo Hasegawa

Proceedings Volume 6924, 69241I (2008) https://doi.org/10.1117/12.771962

KEYWORDS: Polarization, Projection systems, Birefringence, Jones matrices, Distortion, Metrology, Laser induced plasma spectroscopy, Optical simulations, Wavefront aberrations, Image processing

Read Abstract +

Proceedings Article | 1 April 2008 Paper

Immersion exposure system using high-index materials

Keita Sakai, Yuichi Iwasaki, Sunao Mori, Akihiro Yamada, Makoto Ogusu, Keiji Yamashita, Tomofumi Nishikawara, Takatoshi Tanaka, Noriyasu Hasegawa, Shin-ichi Hara, Yutaka Watanabe

Proceedings Volume 6924, 69242H (2008) https://doi.org/10.1117/12.775142

KEYWORDS: Absorbance, Oxygen, Microfluidics, Semiconducting wafers, Water, Contamination, Particles, Immersion lithography, Refractive index, Birefringence

Read Abstract +

Proceedings Article | 14 May 2007 Paper

ArF Immersion Lithography for 45-nm and beyond

Akihiro Yamada

Proceedings Volume 6607, 66071G (2007) https://doi.org/10.1117/12.729263

KEYWORDS: Polarization, Immersion lithography, Refractive index, Semiconducting wafers, Imaging systems, Astatine, Projection systems, Defect inspection, Glasses, Wavefront aberrations

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Impact of illumination performance on hyper-NA imaging for 45-nm node

Ken-Ichiro Mori, Akihiro Yamada, Takahisa Shiozawa, Kazuhiro Takahashi

Proceedings Volume 6520, 652037 (2007) https://doi.org/10.1117/12.711862

KEYWORDS: Polarization, Light sources, Optical proximity correction, Critical dimension metrology, Lithographic illumination, Lithography, Projection systems, Light, Fiber optic illuminators, Birefringence

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Eiji Sakamoto, Keita Sakai, Akihiro Yamada, Tokuyuki Honda

Proceedings Volume 6520, 65201Q (2007) https://doi.org/10.1117/12.711940

KEYWORDS: Refractive index, Transmittance, Silica, Temperature metrology, Projection systems, Semiconducting wafers, Immersion lithography, Microfluidics, Absorption, Water

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years