Ion Beam Sputtering systems are well established as state-of-the-art deposition tools for the coating of high quality optical thin films with high density and low losses. These coatings are used for many laser applications, with an ever-increasing demand for higher sustained fluence. Ion Beam Sputtering (IBS) is a known technique to provide such high optical quality thin films. Indeed, it allows to achieve high density layers with low absorption and scattering. In this work, various coatings were developed using Bühler IBS technology. Then, total losses were measured using Cavity Ring Down, absorption using Laser Induced Deflection or Laser thermography, and Total Integrated Scatter using dedicated scatterometers. A correlation between the effect of the chosen deposition method and parameters and the measurement performances were made with the aim of a better understanding of the level and the origin of losses in the coatings. Finally, highly reflecting mirror coatings for 1064 nm wavelength were fabricated with different designs and deposition parameters. The results of the different measurements of absorption, scattering and total losses using different equipment are presented and discussed.
In many laser applications, there is a higher and higher demand for more efficient coatings with reduced losses, in terms of absorption and scattering as those are contributing factors to diverse laser damage regimes. Ion Beam Sputtering (IBS) is a known technique to provide such high optical quality thin films. Indeed, it allows to achieve high density layers with low absorption and scattering. In this work, various coatings were developed using Bühler IBS technology. Then, total losses were measured using Cavity Ring Down, absorption using Laser Induced Deflection or Laser thermography, and Total Integrated Scatter using dedicated scatterometers. A correlation between the effect of the chosen deposition method and parameters and the measurement performances were made with the aim of a better understanding of the level and the origin of losses in the coatings. Finally, highly reflecting mirror coatings for 1064 nm wavelength were fabricated with different designs and deposition parameters. The results of the different measurements of absorption, scattering and total losses using different equipment are presented and discussed.
Completing our suite of deposition equipment, we are developing a new Ion Beam Sputtering (IBS) System with different substrate configurations: the High Throughput version (HT) and the High Precision version (HP). The HT version enables the coating of 4 planets of up to 350mm diameter substrates, whereas the HP version allows coating of substrates up to 600mm diameter in a single planet configuration. The IBS system is configured with a Bühler proprietary Optical Monitoring System for layer termination, a large 22cm RF sputtering source, and a LION plasma source for assist. In this presentation the optical performance of this IBS coatings, including LIDT, absorption, total loss and residual coating stress, will be discussed and compared to the other available deposition techniques, such as Plasma Assisted Reactive Magnetron Sputtering, and Plasma Ion Assisted deposition (PIAD). Preliminary results of a 1064nm mirror show less than 5ppm absorption, reflectivity’s of 99.997%, and no visible damage in CW LIDT testing up to 10MW/cm2. Pulsed laser damage testing is in process and will be reported. These results will be compared to the coatings being done using PARMS and Evaporation.
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