Mr. Andrew Estroff Profile

Andrew Estroff

at Rochester Institute of Technology

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 12 April 2013 Paper

Line edge roughness (LER) mitigation studies specific to interference-like lithography

Burak Baylav, Andrew Estroff, Peng Xie, Bruce Smith

Proceedings Volume 8683, 86831Y (2013) https://doi.org/10.1117/12.2011505

KEYWORDS: Line edge roughness, Photomasks, Nanoimprint lithography, Image filtering, Lithography, Semiconducting wafers, Projection lithography, Critical dimension metrology, Diffraction, Image processing

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Proceedings Article | 11 March 2010 Paper

Metamaterials for enhancement of DUV lithography

Andrew Estroff, Neal Lafferty, Peng Xie, Bruce Smith

Proceedings Volume 7640, 76402W (2010) https://doi.org/10.1117/12.848427

KEYWORDS: Surface plasmons, Aluminum, Deep ultraviolet, Dielectrics, Molybdenum, Metamaterials, Reflectivity, Refractive index, Tin, Reflection

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Proceedings Article | 26 March 2007 Paper

Quantum state control interference lithography and trim double patterning for 32-16-nm lithography

Robert Frankel, Bruce Smith, Andrew Estroff

Proceedings Volume 6520, 65202L (2007) https://doi.org/10.1117/12.717731

KEYWORDS: Lithography, Double patterning technology, Stimulated emission depletion microscopy, Interferometry, Optical lithography, Diffraction, Photoresist materials, Diffraction gratings, Microscopy, Deep ultraviolet

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Proceedings Article | 20 March 2006 Paper

Intensive 2D SEM model calibration for 45nm and beyond

George Bailey, Thuy Do, Yuri Granik, Ir Kusnadi, Andrew Estroff

Proceedings Volume 6154, 61542W (2006) https://doi.org/10.1117/12.655076

KEYWORDS: Scanning electron microscopy, Calibration, Data modeling, Process modeling, Image processing, Critical dimension metrology, Optical calibration, Metrology, Electron microscopes, Optical proximity correction

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Proceedings Article | 15 March 2006 Paper

Evanescent wave imaging in optical lithography

Bruce Smith, Yongfa Fan, Jianming Zhou, Neal Lafferty, Andrew Estroff

Proceedings Volume 6154, 61540A (2006) https://doi.org/10.1117/12.657322

KEYWORDS: Wave propagation, Refractive index, Photoresist materials, Lithography, Optical lithography, Photomasks, Near field, Interfaces, Imaging systems, Solids

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Proceedings Article | 8 November 2005 Paper

Source polarization and OPC effects on illumination optimization

Travis Brist, George Bailey, Alexander Drozdov, Andres Torres, Andrew Estroff, Eric Hendrickx

Proceedings Volume 5992, 599232 (2005) https://doi.org/10.1117/12.632371

KEYWORDS: Optical proximity correction, Polarization, Lithographic illumination, Lithography, Visualization, Immersion lithography, Fiber optic illuminators, Optical design, Scanners, Data modeling

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Proceedings Article | 8 November 2005 Paper

Reverse engineering source polarization error

George Bailey, Kostas Adam, Travis Brist, Olivier Toublan, Andrew Estroff

Proceedings Volume 5992, 599234 (2005) https://doi.org/10.1117/12.632420

KEYWORDS: Polarization, Data modeling, Reverse modeling, Error analysis, Immersion lithography, Reverse engineering, Critical dimension metrology, Semiconducting wafers, Calibration, Lithography

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SPIE Journal Paper | 1 July 2005

Mask-induced polarization effects at high numerical aperture

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Bruce Smith

JM3, Vol. 4, Issue 03, 031107, (July 2005) https://doi.org/10.1117/12.10.1117/1.2037507

KEYWORDS: Polarization, Polarizers, Refractive index, Binary data, Photomasks, Metals, Chromium, Dielectric polarization, Silicon, Sodium

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Proceedings Article | 12 May 2005 Paper

Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov, Neal Lafferty, Frank Cropanese, Lena Zavyalova, Andrew Estroff, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602533

KEYWORDS: Refractive index, Absorbance, Microfluidics, Immersion lithography, Absorption, Water, Quartz, Prisms, Sodium, 193nm lithography

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Proceedings Article | 12 May 2005 Paper

Mask induced polarization effects at high NA

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Bruce Smith, Philippe Foubert, L. Leunissen, Vicky Philipsen, Yuri Aksenov

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602422

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Refractive index, Spectroscopy, Silicon, Diffraction, Phase shifting, Refraction

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Proceedings Article | 12 May 2005 Paper

ILSim: a compact simulation tool for interferometric lithography

Yongfa Fan, Anatoly Bourov, Lena Zavyalova, Jianming Zhou, Andrew Estroff, Neal Lafferty, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.621286

KEYWORDS: Polarization, Thin films, Interferometry, Reflection, Interfaces, Lithography, Imaging systems, Thin film coatings, Immersion lithography, Nanolithography

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Proceedings Article | 28 May 2004 Paper

Synthesis of projection lithography for low k1 via interferometry

Frank Cropanese, Anatoly Bourov, Yongfa Fan, Andrew Estroff, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547727

KEYWORDS: Lithography, Interferometry, Projection systems, Signal attenuation, Diffraction, Projection lithography, Demodulation, Interferometers, Optical lithography, Line edge roughness

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Proceedings Article | 28 May 2004 Paper

Mask induced polarization

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Frank Cropanese, Neal Lafferty, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.546423

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Chromium, Dielectric polarization, Silica, Silicon, Phase shifts, Objectives

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Proceedings Article | 28 May 2004 Paper

Benefiting from polarization effects on high-NA imaging

Bruce Smith, Lena Zavyalova, Andrew Estroff

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537266

KEYWORDS: Polarization, Reflectivity, Dielectric polarization, Diffraction, Photomasks, Polarizers, Thin films, Reflection, Diffraction gratings, Binary data

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Showing 5 of 14 publications

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