CONFERENCE PROCEEDINGS
Advanced Search
Dr. Benjamin Cabannes-Boué
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 22 February 2021 Presentation + Paper
Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, Marc Zelsmann
Proceedings Volume 11612, 116120O (2021) https://doi.org/10.1117/12.2583717
KEYWORDS: Lithography, Directed self assembly, Silicon, Etching, Semiconducting wafers, Photonic metamaterials, Photomasks, Metamaterials, Manufacturing, Line edge roughness
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top