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Brian Duffy
Senior Director at KLA Corp
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Publications (1)
Proceedings Article | 8 November 2012 Paper
Photomask film degradation effects in the wafer fab: how to detect and monitor over time
Proceedings Volume 8522, 85221D (2012) https://doi.org/10.1117/12.968166
KEYWORDS: Semiconducting wafers, Reticles, Photomasks, Inspection, Process control, Critical dimension metrology, Manufacturing, Signal processing, Metrology, Semiconductors
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