Dr. Bryan D. Vogt Profile
Dr. Bryan D. Vogt
Chemical Engineer at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 3 April 2007 Paper
Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest
Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659
KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

Proceedings Article | 22 March 2007 Paper
Vivek Prabhu, Bryan Vogt, Shuhui Kang, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest
Proceedings Volume 6519, 651910 (2007) https://doi.org/10.1117/12.712311
KEYWORDS: Polymers, Reflectivity, Interfaces, Scattering, Photoresist materials, Photoresist developing, Silicon, X-rays, In situ metrology, Standards development

Proceedings Article | 22 March 2007 Paper
Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682
KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

Proceedings Article | 29 March 2006 Paper
Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu
Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464
KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540
KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831
KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594
KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746
KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

Proceedings Article | 4 May 2005 Paper
Vivek Prabhu, Bryan Vogt, Wen-Li Wu, Jack Douglas, Eric Lin, Sushil Satija, Dario Goldfarb, Hiroshi Ito
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598956
KEYWORDS: Polymers, Reflectivity, Interfaces, Ionization, Photoresist materials, Thin films, Photoresist developing, Standards development, Dielectrics, Liquids

SPIE Journal Paper | 1 January 2005
Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos
JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852
KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

Proceedings Article | 14 May 2004 Paper
Vivek Prabhu, Michael Wang, Erin Jablonski, Bryan Vogt, Eric Lin, Wen-Li Wu, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535862
KEYWORDS: Reflectivity, Photoresist developing, Surface roughness, Atomic force microscopy, Polymers, Photoresist materials, Scattering, Critical dimension metrology, Semiconducting wafers, X-rays

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881
KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536656
KEYWORDS: Diffusion, Photoresist materials, Polymers, Molecules, Scattering, Interfaces, Lithography, Distance measurement, Manufacturing, Chemically amplified resists

Showing 5 of 13 publications
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