Chang-Hwan Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535976
KEYWORDS: Chromium, Photomasks, Resolution enhancement technologies, Optical alignment, Laser processing, Semiconducting wafers, Phase shifts, Lithography, Logic devices, Control systems

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534999
KEYWORDS: Polymers, Mask making, Lithography, Chemistry, Line edge roughness, Photomasks, Electron beam lithography, Reticles, Polymethylmethacrylate, Extreme ultraviolet lithography

Proceedings Article | 28 August 2003 Paper
Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504395
KEYWORDS: Photomasks, Inspection, Quartz, Dry etching, Finite-difference time-domain method, Lithography, Defect inspection, Semiconducting wafers, Mask making, Defect detection

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458290
KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341
KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438348
KEYWORDS: Chromium, Chemically amplified resists, Scattering, Fluctuations and noise, Photomasks, Mask making, Etching, Electron beam lithography, Lithography, Scanning electron microscopy

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438359
KEYWORDS: Etching, Dry etching, Critical dimension metrology, Photoresist processing, Chromium, Data modeling, Photomasks, Instrument modeling, Scattering, Diffusion

Proceedings Article | 22 August 2001 Paper
Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436747
KEYWORDS: Critical dimension metrology, Absorption, Photoresist materials, Deep ultraviolet, Photoresist processing, Resistance, Etching, Copper, Optical lithography, Reflection

Proceedings Article | 20 August 2001 Paper
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436658
KEYWORDS: Critical dimension metrology, Mask making, Photoresist processing, Photomasks, Chromium, Diffusion, Optical proximity correction, Ions, Chemistry, Projection systems

Proceedings Article | 9 April 2001 Paper
Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425090
KEYWORDS: Photomasks, Photoresist processing, Mask making, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Chemically amplified resists, Scattering, Vestigial sideband modulation, Diffusion

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410764
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Chemically amplified resists, Mask making, Photoresist processing, Scattering, Diffusion, Scanning electron microscopy, Contamination

Proceedings Article | 29 June 1998 Paper
Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310727
KEYWORDS: Photomasks, Lithography, Critical dimension metrology, 193nm lithography, Photoresist processing, Photoresist developing, Monochromatic aberrations, Optical lithography, Control systems, Photoresist materials

Proceedings Article | 29 June 1998 Paper
Hyoungjoon Kim, Sunggi Kim, Chang-Hwan Kim, Jin Hong, Junghyun Lee, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310798
KEYWORDS: Photomasks, Manufacturing, Diffraction, Semiconducting wafers, Light sources, Projection systems, Lithium, Lithography, Optical lithography, Resolution enhancement technologies

Proceedings Article | 14 June 1996 Paper
Sang-Jun Choi, Si-Young Jung, Chang-Hwan Kim, Choon-Geun Park, Woo-Sung Han, Young-Bum Koh, Moon-Yong Lee
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241831
KEYWORDS: Deep ultraviolet, Photoresist materials, Polymers, Excimer lasers, Lithography, Photoresist developing, Spectroscopy, Chemically amplified resists, Ultraviolet radiation, Absorption

Showing 5 of 14 publications
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