A calibration method of shear amount based on the optical layout of point source microscope (PSM) for lateral shearing interferometric (LSI) wavefront sensor is proposed. A simulation model of quadriwave LSI is introduced to analyze the influence of the window size of the spatial filter and the shear amount on the accuracy of the shearing wavefront feature extraction (SWFE) method. Simulation results show that the accuracy of the SWFE method deteriorates at small shear amounts. The proposed calibration method makes use of the optical layout of PSM to generate spot images of the point source at the detector plane of the sensor itself. The shear amount is calibrated by the relationship between the lateral distance of the spot images and the distribution of the diffraction orders of the grating. In the experiments, an SID4 wavefront sensor and a circular-aperture modified Hartmann mask LSI wavefront sensor are calibrated by the proposed method. A phase plate etched with patterns has been manufactured as the test specimen. The etching depth is characterized by the two wavefront sensors, and the testing results are compared with that by a commercial ZYGO® interferometer. The feasibility and accuracy of the proposed calibration method are validated. This calibration method provides an easily conducted approach for calibrating the shear amount of LSI wavefront sensor with high accuracy.
A compact lateral shearing interferometer (LSI) based on circular Modified Hartmann Mask (cMHM) is proposed for the measurement of wavefront aberrations. A cMHM grating consists of a circular apertures amplitude grating and a phase chessboard grating. By choosing the radius of the circular aperture of the amplitude grating to be the first positive root of Bessel function, residual diffraction orders are suppressed. As a result, the diffraction field of cMHM is close to that of the ideal quadriwave lateral shearing interference which only contains ±1 orders in two orthogonal directions. An interferometer adopting cMHM as the diffraction element exhibits a diminished Talbot effect on the detection plane as those adopting the conventional Modified Hartmann Mask (MHM) grating or the improved Randomly Encoded Hybrid Grating (REHG). Compared with the REHG, the cMHM requires non-strict manufacturing process. Numerical simulations shows a better diffraction efficiency compared with that using the conventional MHM grating. In the experiments, the interferograms captured by the cMHM-LSI exhibit the same level of contrast as those by MHM-LSI.
Defocusing binary patterns to generate digital sinusoidal fringe patterns with a digital-light-processing projector has been pivotal in phase measurement profilometry with fringe projection techniques. However, despite all its merits, squared binary defocusing (SBD) has been borne with limitations: (1) limited defocusing range; (2) difficulty in quantifying the amount of defocus together with non-negligible residual high-frequency harmonic phase errors. Recently, three-dimensional profilometry with exponential fringe projection has been successfully demonstrated to be robust to high-order harmonics and related phase errors. In this paper, we compare the potential errors for digital sinusoidal fringe generation with both binary-exponential defocusing (BED) and squared binary defocusing (SBD) induced by varying the degree of defocusing specifically at low levels of defocus or extended defocusing range. Results show that in most scenarios, the error for the BED method is smaller than that of the SBD method especially at extended defocusing range. Therefore, generating a sinusoidal fringe image using a BED method seems to be appealing and promising for three-dimensional profilometry with projector defocusing at an extended defocusing or projection range.
Obtaining a three-dimensional profile of an object in optical fringe pattern projection techniques with phase-shifting algorithms and methods requires phase unwrapping. This is known to be prone not only to the sampling rate and sharp profile edges but also to perturbations in the fringe pattern image. The efficiency of sparse decomposition and localized adaptive fringe pattern image enhancement in optical digital fringe-projection profilometry is comparatively analyzed and presented in this paper. The sparse decomposition technique utilizes correlation in three-dimensional transform domain to obtain a sparse representation of the signal for matching decomposed blocks with desired qualities while the localized adaptive method uses thresholding to correlate signal coefficients in transform domain to shrink undesired components. Analysis shows that sparse decomposition preserves essential features of phase signal, and tends to produce filtered fringe image of consistently good wrapped phase map for further wrap processing; yet localized adaptive method’s enhancement capability seemingly diminishes with increase in variation of noise standard deviation or sigma. Numerical simulations and results are presented to demonstrate the differential efficiency and comparative advantage of two enhancement techniques. This analysis is promising as a measure of robustness in fringe-enhancement techniques and other methods for three-dimensional measurement accuracy in optical fringe projection profilometry and metrology.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.