CONFERENCE PROCEEDINGS
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Chao-Jen Tsou
at Qoniac GmbH
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Author
Publications (4)
Proceedings Article | 10 April 2024 Poster + Paper
Overlay control improvements through dynamic sampling
Onur Demirer, Robin Maximilian Zech, Chao-Jen Tsou, W. Wang, C. Huang, Elvis Yang, Afu Chiu, Alexander Muehle, Holger Bald, Clemens Utzny, Scott Eitapence, Boris Habets
Proceedings Volume 12955, 1295527 (2024) https://doi.org/10.1117/12.3009830
KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Simulations, Scanners, Metrology, Lithography, Advanced process control, High volume manufacturing
Proceedings Article | 28 April 2023 Poster + Paper
Development of novel focus spot detection methods for high-volume manufacturing
Syed Naime Mohammad, Chao-Jen Tsou, Afu Chiu, Norman Birnstein, Erick deGouw, Clemens Utzny, Philip Groeger, Stefan Buhl, W. Wang, C. Huang, Elvis Yang, T. Yang, K. Chen
Proceedings Volume 12494, 1249415 (2023) https://doi.org/10.1117/12.2657965
KEYWORDS: Semiconducting wafers, Scanners, Contamination, High volume manufacturing, Particles, Neodymium, Tunable filters, Defense systems, Sensors, Image enhancement
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A new development algorithm to optimize scanner alignment sampling for cross-chuck overlay performance optimization
Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Chao-Jen Tsou, Shengyuan Zhong, Norman Birnstein, Robin Maximilian Zech, Clemens Utzny, Jin Zhu, Jincheng Pei, Kevin Huang
Proceedings Volume 12053, 1205329 (2022) https://doi.org/10.1117/12.2627283
KEYWORDS: Optical alignment, Optimization (mathematics), Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Performance modeling, Semiconductors
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A comprehensive study of scanner alignment mark quantity and layout-dependent effect for overlay performance optimization
Proceedings Volume 12053, 1205319 (2022) https://doi.org/10.1117/12.2614375
KEYWORDS: Optical alignment, Semiconducting wafers, Scanners, Overlay metrology, Optimization (mathematics), Computer simulations, Performance modeling, Device simulation, Data modeling
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