Mr. Cheuk Wun Wong Profile

Cheuk Wun Wong

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Publications (10)

Proceedings Article | 10 April 2024 Presentation

Optical and SEM-based overlay metrology study on process-induced overlay inaccuracy

Cheuk Wun Wong

Proceedings Volume 12955, 129550S (2024) https://doi.org/10.1117/12.3010935

KEYWORDS: Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Logic, Etching, Chemical mechanical planarization, Optical parametric oscillators, Optical microscopes, Metals, Electron microscopes

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Proceedings Article | 27 April 2023 Presentation + Paper

Overlay performance in permanent bonded wafer integration schemes

Nathan Ip, Michael Belyansky, Christopher Netzband, Norifumi Kohama, Richard Johnson, Shobha Hosadurga, Jack Wong, John Arnold, Kisik Choi, Wai Kin Li, Indira Seshadri, Luciana Meli, Ilseok Son

Proceedings Volume 12496, 1249618 (2023) https://doi.org/10.1117/12.2654679

KEYWORDS: Wafer bonding, Semiconducting wafers, Distortion, Overlay metrology, Metrology, Scanners, Optical alignment, Silicon, Interfaces, Data modeling

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Proceedings Article | 26 May 2022 Paper

Predicting overlay mark performance based on process emulation and optical simulation

Sagarika Mukesh, Jack (Cheuk Wun) Wong, Scott Halle, Allen Gabor

Proceedings Volume 12053, 120531W (2022) https://doi.org/10.1117/12.2613785

KEYWORDS: Overlay metrology, Optical simulations, Calibration, Optical lithography, Optical filters, Metrology, Photomasks, Semiconductors, Semiconducting wafers, Data modeling

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Proceedings Article | 22 February 2021 Presentation + Paper

Self-referenced and self-calibrated MoiréOVL target design and applications

Cheuk Wun Wong, Neelima Rathi, Taher Kagalwala, Karsten Gutjahr, Patrick Snow, Tony Joung, Tam Vuong, Apollo Marmarinos, Gorby Wan

Proceedings Volume 11611, 1161122 (2021) https://doi.org/10.1117/12.2583733

KEYWORDS: Overlay metrology, Calibration, Signal processing, Optical parametric oscillators, Moire patterns, Metrology, Interference (communication), Target detection, Semiconductor manufacturing, Semiconducting wafers

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Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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Proceedings Article | 15 March 2016 Paper

Patterned wafer geometry (PWG) metrology for improving process-induced overlay and focus problems

Timothy Brunner, Yue Zhou, Cheuk W. Wong, Bradley Morgenfeld, Gerald Leino, Sunit Mahajan

Proceedings Volume 9780, 97800W (2016) https://doi.org/10.1117/12.2218630

KEYWORDS: Semiconducting wafers, Metrology, Lithography, Overlay metrology, Silicon, Error control coding, Distortion, Optical lithography, Process control, Data modeling, Oxides, Silicon films, Thin films

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Proceedings Article | 31 March 2014 Paper

Characterization and mitigation of overlay error on silicon wafers with nonuniform stress

T. Brunner, V. Menon, C. Wong, N. Felix, M. Pike, O. Gluschenkov, M. Belyansky, P. Vukkadala, S. Veeraraghavan, S. Klein, C. H. Hoo, J. Sinha

Proceedings Volume 9052, 90520U (2014) https://doi.org/10.1117/12.2045715

KEYWORDS: Semiconducting wafers, Overlay metrology, Electronic support measures, Distortion, Optical alignment, Metrology, Photomasks, Lithography, Silicon, Laser range finders

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SPIE Journal Paper | 25 October 2013 Open Access

Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

Timothy Brunner, Vinayan Menon, Cheuk Wong, Oleg Gluschenkov, Michael Belyansky, Nelson Felix, Christopher Ausschnitt, Pradeep Vukkadala, Sathish Veeraraghavan, Jaydeep Sinha

JM3, Vol. 12, Issue 04, 043002, (October 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.043002

KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

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Proceedings Article | 10 April 2013 Paper

CD optimization methodology for extending optical lithography

C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

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Showing 5 of 10 publications

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