Dr. Christian Neuber Profile

Dr. Christian Neuber

at Univ Bayreuth

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Publications (8)

Proceedings Article | 21 March 2016 Paper

PVD prepared molecular glass resists for scanning probe lithography

Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Daniel Wagner, Felix Krohn, Andreas Schedl, Simon Bonanni, Felix Holzner, Colin Rawlings, Urs Dürig, Armin Knoll

Proceedings Volume 9779, 97791C (2016) https://doi.org/10.1117/12.2219080

KEYWORDS: Scanning probe lithography, Molecules, Physical vapor deposition, Polymers, Photoresist materials, Lithography, Resistance, Etching, Crystals, Silicon, Silica, Optical lithography, Thin films

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Proceedings Article | 20 March 2015 Paper

Tailored molecular glass resists for scanning probe lithography

Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9425, 94250E (2015) https://doi.org/10.1117/12.2085734

KEYWORDS: Glasses, Scanning probe lithography, Etching, Thin films, Optical lithography, Plasma etching, Resistance, Electron beam lithography, Lithography, Crystals

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Proceedings Article | 17 March 2015 Paper

Molecular glass resist performance for nano-pattern transfer

Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, Jean-François de Marneffe

Proceedings Volume 9428, 94280J (2015) https://doi.org/10.1117/12.2085828

KEYWORDS: Etching, Glasses, Surface roughness, Refractive index, Plasma, Optical lithography, Scanning probe lithography, Atomic force microscopy, Photoresist materials, Lithography

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Proceedings Article | 28 March 2014 Paper

Molecular glass resists for scanning probe lithography

Christian Neuber, Andreas Ringk, Tristan Kolb, Florian Wieberger, Peter Strohriegl, Hans-Werner Schmidt, Vincent Fokkema, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean-Francois de Marneffe, Peter De Schepper, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9049, 90491V (2014) https://doi.org/10.1117/12.2047108

KEYWORDS: Glasses, Etching, Scanning probe lithography, Lithography, Optical lithography, Silicon, Electron beam lithography, Polymers, Resistance, Photoresist processing

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Proceedings Article | 28 March 2014 Paper

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, Ivo Rangelow

Proceedings Volume 9049, 90490C (2014) https://doi.org/10.1117/12.2046973

KEYWORDS: Scanning probe lithography, Lithography, Electron beam lithography, Glasses, Software development, Control systems, Optical lithography, Manufacturing, Actuators, Scanners

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Proceedings Article | 27 March 2014 Paper

Nanopatterning with tailored molecules

Florian Wieberger, Tristan Kolb, Christian Neuber, Christopher Ober, Hans-Werner Schmidt

Proceedings Volume 9051, 90510G (2014) https://doi.org/10.1117/12.2047109

KEYWORDS: Stars, Polymers, Magnesium, Line edge roughness, Polymerization, Line width roughness, Scanning electron microscopy, Optical spheres, Quartz, Crystals

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Proceedings Article | 31 March 2010 Paper

All-dry processible and PAG-attached molecular glasses for improved lithographic performance

Marie Krysak, Tristan Kolb, Christian Neuber, Hans-Werner Schmidt, Christopher Ober

Proceedings Volume 7639, 76392C (2010) https://doi.org/10.1117/12.848385

KEYWORDS: Glasses, Molecules, Magnesium, Polymers, Line edge roughness, Semiconducting wafers, Lithography, Silicon, Photoresist materials, Semiconductors

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Proceedings Article | 26 March 2008 Paper

All-dry photoresist systems: physical vapor deposition of molecular glasses

Frauke Pfeiffer, Christian Neuber, Hans-Werner Schmidt

Proceedings Volume 6923, 69231F (2008) https://doi.org/10.1117/12.771101

KEYWORDS: Glasses, Photoresist materials, Ultraviolet radiation, Optical lithography, Physical vapor deposition, Semiconducting wafers, Photoresist developing, Molecules, Photomasks, Quartz

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Showing 5 of 8 publications

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