Dr. Daisuke Bizen Profile

Dr. Daisuke Bizen

at Hitachi Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Non-destructive depth measurement using SEM signal intensity

Jong-Hyun Seo, Changhwan Lee, Byoungho Lee, Ayumi Doi, Aoi Yamauchi, Daisuke Bizen, Makoto Suzuki

Proceedings Volume 11611, 116112Q (2021) https://doi.org/10.1117/12.2583623

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SPIE Journal Paper | 18 September 2019

CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

JM3, Vol. 18, Issue 03, 034004, (September 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.3.034004

SPIE Journal Paper | 6 April 2019

Influence of e-beam aperture angle on critical dimensions-scanning electron microscopes measurements for high aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

JM3, Vol. 18, Issue 02, 021204, (April 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021204

KEYWORDS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection

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Proceedings Article | 26 March 2019 Paper

High-resolution low-shrinkage CD metrology for EUV resist using high voltage CD-SEM

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

Proceedings Volume 10959, 109591D (2019) https://doi.org/10.1117/12.2514797

KEYWORDS: Extreme ultraviolet, Monte Carlo methods, Critical dimension metrology, Line edge roughness, Electrons, Spatial resolution, Extreme ultraviolet lithography, Metrology, Scanning electron microscopy

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Proceedings Article | 13 March 2018 Paper

Influence of e-beam aperture angle on CD-SEM measurements for high-aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

Proceedings Volume 10585, 105851A (2018) https://doi.org/10.1117/12.2296756

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Cadmium, Silicon, Critical dimension metrology, Spatial resolution, Optical simulations, 3D metrology, Semiconductors, Laser scattering

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SPIE Journal Paper | 29 June 2017

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

JM3, Vol. 16, Issue 02, 024004, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.024004

KEYWORDS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering

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Proceedings Article | 28 March 2017 Paper

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

Proceedings Volume 10145, 101451K (2017) https://doi.org/10.1117/12.2257205

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Semiconductors, Logic, Logic devices, 3D metrology, Process control, Electrons, Selenium, Silicon, Critical dimension metrology, Image filtering

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Proceedings Article | 2 April 2014 Paper

Dependence of secondary-electron yield on aspect ratio of several trench patterns

Daisuke Bizen, Yasunari Sohda, Hideyuki Kazumi

Proceedings Volume 9050, 90500K (2014) https://doi.org/10.1117/12.2044662

KEYWORDS: Silicon, Monte Carlo methods, Autoregressive models, Scanning electron microscopy, Silica, Electrons, Selenium, Amorphous silicon, Argon, Etching

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Showing 5 of 8 publications

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