Tin-gallium oxide (TGO) epilayers have been characterized through the electron microscopy techniques of wavelength-dispersive X-ray spectroscopy (WDX) and cathodoluminescence. Tin incorporation was found to be highly dependent on growth conditions with (0001)-sapphire and (010)-Ga2O3 substrates enhancing tin incorporation. Cathodoluminescence measurements show that TGO luminescence consists of an enhanced blue emission and quenched UV when compared to Ga2O3.and the onset of new green emission originating from the TGO, further correlated through cross-sectional WDX and cathodoluminescence mapping. As well as luminescence intensity changes TGO films display redshifted luminescence bands associated with a bandgap reduction due to the alloying, confirmed through optical transmission measurements.
Atomic layer deposition (ALD) offers a low thermal budget method for producing α-Ga2O3 films on sapphire substrate. In this paper we review the recent progress on plasma-enhanced ALD growth of α-Ga2O3 and present the optical and photoconductive properties of the deposited films. We show that the deposited material exhibits an epitaxial relationship with the sapphire substrate, and with an atomically sharp film-substrate interface. The α-Ga2O3 films had an optical bandgap energy measured at 5.11 eV, and exhibited a broad luminescence spectrum dominated by ultraviolet, blue and green bands, in line with current literature. We finally demonstrate the suitability of the material for solar-blind photodetection.
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