Mr. Dave Houser Profile

Dave Houser

CTO at EUV Tech

Area of Expertise:

EUV Metrology Capital Equipment , EUV Light Sources , EUV Optics and Coatings , Ultra Clean Sample Transfer , Vacuum Systems , Industrial Safety and Compliance

Publications (11)

Proceedings Article | 13 November 2024 Presentation

Metrology-class EUV light source based on broadband emission from copper-target laser produced plasma

Seth Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 13216, 132160X (2024) https://doi.org/10.1117/12.3035515

KEYWORDS: Extreme ultraviolet, Plasma, Metrology, Light sources, Copper, Pulsed laser operation, Scatterometry, Reflectometry, Laser systems engineering, Engineering

Read Abstract +

Proceedings Article | 13 November 2024 Presentation

Sub-angstrom critical dimension metrology with EUV scatterometry

Stuart Sherwin, Matt Hettermann, Dave Houser, Luke Long, Patrick Naulleau

Proceedings Volume 13216, 132160V (2024) https://doi.org/10.1117/12.3035715

KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scatterometry, Photomasks, Scanning electron microscopy, SRAF, Metrology, Simulations, Resolution enhancement technologies, Process control

Read Abstract +

SPIE Journal Paper | 8 November 2024

Understanding and measuring EUV mask 3D effects

Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

JM3, Vol. 23, Issue 04, 041407, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041407

Read Abstract +

Proceedings Article | 10 April 2024 Poster + Paper

Metrology-class EUV light source based on quasi-continuous copper LPP

Seth Cousin, Feng Dong, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 12953, 129531D (2024) https://doi.org/10.1117/12.3012186

KEYWORDS: Extreme ultraviolet, Metrology, Copper, Extreme ultraviolet lithography, Reflectometry, Light sources, Laser systems engineering, Plasma, Laser metrology, High volume manufacturing

Read Abstract +

Proceedings Article | 10 April 2024 Presentation + Paper

Understanding and measuring EUV mask 3D effects

Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 12953, 129530F (2024) https://doi.org/10.1117/12.3012400

KEYWORDS: Extreme ultraviolet, Phase shifts, Multilayers, Light sources and illumination, Extreme ultraviolet lithography, Reflection, Ruthenium, 3D mask effects, Tantalum, Scanners

Read Abstract +

Proceedings Article | 22 November 2023 Presentation

EUV actinic scatterometry for in-pattern phase metrology

Stuart Sherwin, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12751, PC127510P (2023) https://doi.org/10.1117/12.2688099

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Scatterometry, Phase measurement, Near field, Light scattering, Laser scattering, Attenuation, 3D mask effects

Read Abstract +

Proceedings Article | 21 November 2023 Presentation + Paper

Development of EUV phase shift mask metrology

Elba Gomar-Nadal, Malahat Tavassoli, Kowtilya Bijjula, Stuart Sherwin, Matt Hettermann, Christian Wilson, Feng Dong, Dave Houser, Alexander Khodarev, Chami Perera, Patrick Naulleau

Proceedings Volume 12751, 127510O (2023) https://doi.org/10.1117/12.2688453

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Reflectance spectroscopy, Reflectometry, Spectroscopy, Signal attenuation, Refractive index, Phase measurement, Thin films

Read Abstract +

Proceedings Article | 30 April 2023 Presentation

EUV phase monitoring applications with actinic reflectometry

Stuart Sherwin, Eric Gullikson, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12494, PC1249408 (2023) https://doi.org/10.1117/12.2662135

KEYWORDS: Extreme ultraviolet, Reflectometry, Phase measurement, Photomasks, Metrology, Reflectance spectroscopy, Spectroscopy, Scatterometry, Plasma, Phase shifts

Read Abstract +

Proceedings Article | 13 June 2022 Presentation

Development of a standalone zoneplate based EUV mask defect review tool

Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes, Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt, Arnaud Allézy, Weilun Chao, Farhad Salmassi, Eric Gullikson, Patrick Naulleau

Proceedings Volume PC12051, PC120510E (2022) https://doi.org/10.1117/12.2617277

KEYWORDS: Extreme ultraviolet, Photomasks, Reticles, Microscopes, Imaging systems, Zone plates, Semiconductors, Semiconducting wafers, Patents, Metrology

Read Abstract +

Proceedings Article | 4 September 2015 Paper

Challenges in constructing EUV metrology tools to qualify the EUV masks for HVM implementation

David Houser, Feng Dong, Chami Perera, Rupert Perera

Proceedings Volume 9661, 96610K (2015) https://doi.org/10.1117/12.2196727

KEYWORDS: Extreme ultraviolet, Photomasks, Reflectivity, Pellicles, Extreme ultraviolet lithography, Metrology, Reflectometry, Lithography, Sensors, Particles

Read Abstract +

Proceedings Article | 14 December 2009 Paper

Challenges in development and construction of stand-alone inspection, metrology, and calibration tools for EUV lithographic applications

James Underwood, David Houser, Aaron Latzke, Rupert Perera

Proceedings Volume 7520, 75200K (2009) https://doi.org/10.1117/12.837086

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Metrology, Lithography, Reflectometry, Semiconducting wafers, Photomasks, Mirrors, Inspection

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years