Mr. David Tseng Profile

David Tseng

at Nikon Research Corp of America

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper

Imaging study of phase shift spatial light modulator for digital scanner

Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12953, 129530R (2024) https://doi.org/10.1117/12.3010082

KEYWORDS: Spatial light modulators, Micromirrors, Optical lithography, Maskless lithography, Phase shifting

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Proceedings Article | 29 September 2023 Paper

Pixel-based data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546

KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

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SPIE Journal Paper | 5 June 2023

Development of deep ultraviolet optical maskless exposure tool for advanced lithography

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403

KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

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Proceedings Article | 28 April 2023 Presentation + Paper

Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730

KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12293, 122930U (2022) https://doi.org/10.1117/12.2641419

KEYWORDS: Scanners, Data conversion, Photomasks, Spatial light modulators, Optical proximity correction, Raster graphics, Semiconducting wafers, Phase shifts, Deep ultraviolet, Maskless lithography

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Proceedings Article | 26 May 2022 Presentation + Paper

Technology development progress of digital scanner

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12051, 1205108 (2022) https://doi.org/10.1117/12.2613902

KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Data conversion, Spatial light modulators, Printing, Deep ultraviolet, Semiconductors, Optical lithography, Solid state lasers

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Proceedings Article | 12 October 2021 Presentation + Paper

Subpixel pattern edge placement controllability of digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Proceedings Volume 11855, 1185508 (2021) https://doi.org/10.1117/12.2600898

KEYWORDS: Spatial light modulators, Projection systems, Scanners, Semiconducting wafers, Digital imaging, Image resolution, Raster graphics, Photomasks, Micromirrors

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Proceedings Article | 22 February 2021 Presentation + Paper

Digital scanner, optical maskless exposure tool with DUV solid state laser

Yoji Watanabe, Hirotaka Kono, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Proceedings Volume 11613, 1161309 (2021) https://doi.org/10.1117/12.2583680

KEYWORDS: Deep ultraviolet, Solid state lasers, Laser scanners, 3D scanning, Spatial light modulators, Semiconducting wafers, Prototyping, Laser optics, Security printing, Printing

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Showing 5 of 8 publications

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