Mr. Don O'Riordan Profile

Don O'Riordan

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Proceedings Article | 23 March 2020 Paper

How utilizing curvilinear design enables better manufacturing process window

Ryan Pearman, Don O'Riordan, Jeff Ungar, Mariusz Niewczas, Leo Pang, Aki Fujimura

Proceedings Volume 11328, 113280S (2020) https://doi.org/10.1117/12.2554859

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturability, Lithography, Computational lithography

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