Dr. Fang Zhang Profile

Dr. Fang Zhang

at Shanghai Institute of Optics & Fine Mechanics,CAS

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 18 December 2023 Paper

Paper

Effects of mid-spatial frequency errors of optical surface on the penumbra width of photolithography relay lens

Jiahong Liu, Fang Zhang, Huijie Huang

Proceedings Volume 12964, 129640N (2023) https://doi.org/10.1117/12.3008049

KEYWORDS: Shadows, Optical surfaces, Relays, Error analysis, Optical lithography, Imaging systems, Surface finishing, Image processing, Spatial frequencies, Partial coherence

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SPIE Journal Paper | 26 February 2021

Design and optimization of top-Gaussian illumination field in photolithography

Xiaozhe Ma, Fang Zhang, Zhiyuan Niu, Huijie Huang

OE, Vol. 60, Issue 02, 025106, (February 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.2.025106

KEYWORDS: Optical lithography, Diffusers, Optical engineering, Error analysis, Manufacturing, Quantization, Optical design, Microlens, Pulsed laser operation, Optical components

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SPIE Journal Paper | 9 September 2020

Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model

Ming Ding, Zhiyuan Niu, Fang Zhang, Linglin Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

JM3, Vol. 19, Issue 03, 033201, (September 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.033201

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SPIE Journal Paper | 18 March 2020

Telecentricity measurement for exposure system of photolithography tools

Youbao Zhang, Xiaozhe Ma, Fang Zhang, Huijie Huang

OE, Vol. 59, Issue 03, 034109, (March 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.3.034109

KEYWORDS: Semiconducting wafers, Optical lithography, Lithography, Photoresist materials, Optical engineering, Photomasks, Fiber optic illuminators, Sensors, Lithographic illumination, Overlay metrology

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Proceedings Article | 24 July 2018 Paper

Paper

Resolution analysis method of retardance measurement instrument

Guiyun Li, Linglin Zhu, Liyuan Gu, Aijun Zeng, Fang Zhang, Huijie Huang

Proceedings Volume 10827, 1082723 (2018) https://doi.org/10.1117/12.2501234

KEYWORDS: Wave plates, Quartz, Birefringence, Crystals, Refractive index, Polarization, Modulation, Optical components, Optical resolution

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Proceedings Article | 24 July 2018 Paper

Paper

Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Xiaozhe Ma, Fang Zhang, Zongshun Zeng, Siyu Zhu, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082733 (2018) https://doi.org/10.1117/12.2501223

KEYWORDS: Fourier transforms, Micromirrors, Lithographic illumination, Sensors, Error analysis, Immersion lithography, Reticles, Optical lithography, Source mask optimization, Light scattering

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Proceedings Article | 24 July 2018 Paper

Paper

An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Zongshun Zeng, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Siyu Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082732 (2018) https://doi.org/10.1117/12.2501208

KEYWORDS: Optical lithography, Optical design, Fourier transforms, Device simulation, Resolution enhancement technologies, Micromirrors, Homogenization, Source mask optimization, Lens design, Optical simulations

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Proceedings Article | 24 July 2018 Paper

Paper

Flexible pupil correction technology for photolithography machine

Siyu Zhu, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Zongshun Zeng, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082731 (2018) https://doi.org/10.1117/12.2501205

KEYWORDS: Optical lithography, Diffractive optical elements, Device simulation, Lithography, Critical dimension metrology, Optical design, Lithographic illumination, Optoelectronics, Resolution enhancement technologies, Standards development

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Proceedings Article | 24 July 2018 Paper

Paper

Study on the highly intelligent uniformity correction and the application for lithography

Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang

Proceedings Volume 10827, 108272H (2018) https://doi.org/10.1117/12.2326837

KEYWORDS: Lithographic illumination, Lithography, Reticles, Excimer lasers, Diffractive optical elements, Optical lithography, Projection systems

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Proceedings Article | 24 July 2018 Paper

Paper

Optimal design of illumination field performance relating to scanning slit in step-and-scan lithographic system

Dongliang Lin, Fang Zhang, Huijie Huang

Proceedings Volume 10827, 108272F (2018) https://doi.org/10.1117/12.2326824

KEYWORDS: Lithography, Lithographic illumination, Reticles, Distortion, Optical scanning systems, Computer simulations

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Proceedings Article | 10 February 2017 Paper

Paper

Design and implementation of a cloud based lithography illumination pupil processing application

Youbao Zhang, Xinghua Ma, Jing Zhu, Fang Zhang, Huijie Huang

Proceedings Volume 10250, 102501Z (2017) https://doi.org/10.1117/12.2266903

KEYWORDS: Lithographic illumination, Clouds, Lithography

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SPIE Journal Paper | 13 April 2015

Fabrication error analysis for diffractive optical elements used in a lithography illumination system

Jian Wang, Fang Zhang, Qiang Song, Aijun Zeng, Jing Zhu, Huijie Huang

OE, Vol. 54, Issue 04, 045102, (April 2015) https://doi.org/10.1117/12.10.1117/1.OE.54.4.045102

KEYWORDS: Diffractive optical elements, Diffraction, Photomasks, Error analysis, Etching, Lithographic illumination, Lithography, Device simulation, Optical lithography, Tolerancing

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Proceedings Article | 11 November 2014 Paper

Paper

Colorful holographic imaging reconstruction based on one thin phase plate

Jing Zhu, Qiang Song, Jian Wang, Weirui Yue, Fang Zhang, Huijie Huang

Proceedings Volume 9271, 92711O (2014) https://doi.org/10.1117/12.2069971

KEYWORDS: Diffractive optical elements, Reconstruction algorithms, Holography, 3D image reconstruction, Image quality, Holograms, Wave propagation, Diffraction, Spatial light modulators, Wavefronts

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Proceedings Article | 5 November 2014 Open Access

Open Access

Paper

A simple method generating first-order optical structure based on particle swarm algorithm (withdrawal notice)

Xiangbo Lv, Qiang Song, Rui Wei Yue, Fang Zhang, Jing Zhu, Huijie Huang

Proceedings Volume 9272, 92720L (2014) https://doi.org/10.1117/12.2069385

KEYWORDS: Optical design, Particles, Optical components, Lens design, Head-mounted displays, Zemax, Prototyping, Ray tracing, Distortion, Particle swarm optimization

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Proceedings Article | 19 December 2013 Paper

Paper

Off-line inspection method of microlens array for illumination homogenization in DUV lithography machine

Fang Zhang, Jing Zhu, Baoxi Yang, Lihua Huang, Xiaobang Hu, Yanfen Xiao, Huijie Huang

Proceedings Volume 9046, 904619 (2013) https://doi.org/10.1117/12.2037841

KEYWORDS: Lithographic illumination, Lithography, Inspection, Microlens array, Homogenization, Optical simulations, Diffraction, Excimer lasers, Deep ultraviolet, CCD cameras

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Showing 5 of 15 publications

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