Mr. Frank C. Cropanese Profile

Frank C. Cropanese

Senior Process Engineer at Intel Corp

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Author

Publications (10)

Proceedings Article | 12 May 2005 Paper

Amphibian XIS: an immersion lithography microstepper platform

Bruce Smith, Anatoly Bourov, Yongfa Fan, Frank Cropanese, Peter Hammond

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606467

KEYWORDS: Interferometry, Prisms, Semiconducting wafers, Lithography, Silica, Immersion lithography, Microfluidics, Water, Excimer lasers, Microfluidic imaging

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Proceedings Article | 12 May 2005 Paper

Synthetic defocus in interferometric lithography

Frank Cropanese, Anatoly Bourov, Yongfa Fan, Jianming Zhou, Lena Zavyalova, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602948

KEYWORDS: Modulation, Interferometry, Lithography, Polarization, Projection systems, Interferometers, Demodulation, Critical dimension metrology, Polarizers, Mirrors

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Proceedings Article | 12 May 2005 Paper

Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov, Neal Lafferty, Frank Cropanese, Lena Zavyalova, Andrew Estroff, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602533

KEYWORDS: Refractive index, Absorbance, Microfluidics, Immersion lithography, Absorption, Water, Quartz, Prisms, Sodium, 193nm lithography

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Proceedings Article | 12 May 2005 Paper

Photoresist modulation curves

Anatoly Bourov, Yongfa Fan, Frank Cropanese, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602805

KEYWORDS: Modulation, Photoresist materials, Image processing, Image resolution, Image quality, Performance modeling, Photoresist developing, Electroluminescence, Imaging systems, Prisms

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Proceedings Article | 28 May 2004 Paper

Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov, Yongfa Fan, Frank Cropanese, Neal Lafferty, Lena Zavyalova, Hoyoung Kang, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537350

KEYWORDS: Prisms, Interferometers, Photoresist materials, Excimer lasers, Spatial coherence, Imaging systems, Optical lithography, Interferometry, Temporal coherence, Microfluidic imaging

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Proceedings Article | 28 May 2004 Paper

Mask induced polarization

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Frank Cropanese, Neal Lafferty, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.546423

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Chromium, Dielectric polarization, Silica, Silicon, Phase shifts, Objectives

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Proceedings Article | 28 May 2004 Paper

Approaching the numerical aperture of water immersion lithography at 193-nm

Bruce Smith, Anatoly Bourov, Yongfa Fan, Lena Zavyalova, Neal Lafferty, Frank Cropanese

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537262

KEYWORDS: Water, Refractive index, Immersion lithography, Scattering, Prisms, Light scattering, Mie scattering, Interferometry, Absorption, Optical spheres

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Proceedings Article | 28 May 2004 Paper

Synthesis of projection lithography for low k1 via interferometry

Frank Cropanese, Anatoly Bourov, Yongfa Fan, Andrew Estroff, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547727

KEYWORDS: Lithography, Interferometry, Projection systems, Signal attenuation, Diffraction, Projection lithography, Demodulation, Interferometers, Optical lithography, Line edge roughness

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SPIE Journal Paper | 1 January 2004

Water immersion optical lithography at 193 nm

Bruce Smith, Anatoly Bourov, Hoyoung Kang, Frank Cropanese, Yongfa Fan, Neal Lafferty, Lena Zavyalova

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637594

KEYWORDS: Water, Polarization, Optical lithography, Refractive index, Interferometry, Immersion lithography, Lithography, Photoresist materials, Microfluidics, Absorption

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Proceedings Article | 26 June 2003 Paper

Water immersion optical lithography for the 45-nm node

Bruce Smith, Hoyoung Kang, Anatoly Bourov, Frank Cropanese, Yongfa Fan

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485489

KEYWORDS: Water, Polarization, Optical lithography, Lithography, Refractive index, Interferometry, Immersion lithography, Absorption, Photoresist materials, 193nm lithography

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Showing 5 of 10 publications

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