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Frank Erber
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 1 November 2007 Paper
Pellicle dimensions for high NA photomasks
Frank Erber, Thomas Schulmeyer, Christian Holfeld
Proceedings Volume 6730, 67303Y (2007) https://doi.org/10.1117/12.746681
KEYWORDS: Pellicles, Photomasks, Inspection, Scanners, Manufacturing, Lithography, Sodium, Inspection equipment, Image registration, Image processing
Proceedings Article | 5 September 2001 Paper
Development and characterization of a new plasma etching process for mask manufacturing
Frank Erber, Guenther Ruhl, C. Ebi, Ralf Dietrich, Josef Mathuni, Pavel Nesladek
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438358
KEYWORDS: Etching, Photomasks, Plasma etching, Manufacturing, Dry etching, Critical dimension metrology, Photoresist processing, Plasma, Photoresist materials, Scanning electron microscopy
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