Dr. Gregory A. Rechtsteiner Profile

Dr. Gregory A. Rechtsteiner

at ASML

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 20 March 2018 Presentation + Paper

Tunable bandwidth for application-specific SAxP process enhancement

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans, Gian Francesco Lorusso

Proceedings Volume 10587, 1058705 (2018) https://doi.org/10.1117/12.2300511

KEYWORDS: Light sources, Line width roughness, Semiconducting wafers, Optical lithography, Metrology, Line edge roughness, Etching, Lithography, Temporal coherence

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Proceedings Article | 1 May 2017 Paper

Assessment of light source bandwidth impacts on image contrast enhancement using process window discovery

Paolo Alagna, Greg Rechtsteiner, Will Conley, Andrew Cross, Kaushik Sah, Sandip Halder

Proceedings Volume 10147, 101471X (2017) https://doi.org/10.1117/12.2260314

KEYWORDS: Light sources, Deep ultraviolet, Optical lithography, Image contrast enhancement, Semiconductors, Immersion lithography, Scanners, Inspection, Modulation, Semiconducting wafers

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Proceedings Article | 30 March 2017 Paper

Next-generation DUV light source technologies for 10nm and below

Ted Cacouris, Greg Rechtsteiner, Will Conley

Proceedings Volume 10147, 1014718 (2017) https://doi.org/10.1117/12.2260319

KEYWORDS: Light sources, Deep ultraviolet, Lithography, Optical lithography, Process control, Photomasks, Excimer lasers, Immersion lithography, Critical dimension metrology, Optical proximity correction, Scanners, Beam shaping, Data modeling

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Proceedings Article | 30 March 2017 Presentation + Paper

The impact of lower light source bandwidth on sub-10nm process node features

Will Conley, Paolo Alagna, Jason Shieh, Simon Hsieh, Tsann-Bim Chiou, Stephen Hsu, Greg Rechtsteiner

Proceedings Volume 10147, 1014707 (2017) https://doi.org/10.1117/12.2260210

KEYWORDS: Light sources, Process control, Image processing, Source mask optimization, Lithography, Critical dimension metrology, Optical proximity correction, Control systems, Overlay metrology, Optical lithography, Eye, Metrology, Electroluminescence

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Proceedings Article | 30 March 2017 Presentation + Paper

Image contrast enhancement of multiple patterning features through lower light source bandwidth

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans

Proceedings Volume 10147, 101470N (2017) https://doi.org/10.1117/12.2263228

KEYWORDS: Optical lithography, Light sources, Lithography, Immersion lithography, Semiconductors, Image contrast enhancement, Deep ultraviolet, Semiconductor manufacturing, Manufacturing, Double patterning technology, Optical proximity correction, Semiconducting wafers, Photomasks, Metrology, Source mask optimization

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Proceedings Article | 16 March 2016 Paper

Lower BW and its impact on the patterning performance

Paolo Alagna, Greg Rechtsteiner, Vadim Timoshkov, Patrick Wong, Will Conley, Jan Baselmans

Proceedings Volume 9780, 978008 (2016) https://doi.org/10.1117/12.2219945

KEYWORDS: Optical lithography, Light sources, Lithography, Deep ultraviolet, Data modeling, Electroluminescence, Logic, Metals, Optical proximity correction, Etching

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Proceedings Article | 15 March 2016 Paper

Means to improve light source productivity: from proof of concept to field implementation

E. Rausa, T. Cacouris, W. Conley, M. Jackson, S. Luo, S. Murthy, G. Rechtsteiner, K. Steiner

Proceedings Volume 9780, 97801G (2016) https://doi.org/10.1117/12.2219940

KEYWORDS: Light sources, Excimer lasers, Data analysis, Gases, Lithography, Error analysis, Molybdenum, Laser scanners, 3D scanning, Neodymium, Scanners, Manufacturing, Ions

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Proceedings Article | 4 September 2015 Paper

Advanced process characterization of a 10nm Metal 1 Logic layer using light source modulation and monitoring

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Greg Rechtsteiner, Jan Baselmans, Julien Mailfert, Will Conley, Simon Hsieh

Proceedings Volume 9661, 966105 (2015) https://doi.org/10.1117/12.2196862

KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

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Proceedings Article | 18 March 2015 Paper

Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Gregory Rechtsteiner, Jan Baselmans, Julien Mailfert

Proceedings Volume 9426, 942609 (2015) https://doi.org/10.1117/12.2085823

KEYWORDS: Optical lithography, Logic, Semiconducting wafers, Line width roughness, Light sources, Photomasks, Optical proximity correction, Lithography, Process control, Critical dimension metrology

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Proceedings Article | 18 March 2015 Paper

Advanced process characterization using light source performance modulation and monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner

Proceedings Volume 9426, 94261D (2015) https://doi.org/10.1117/12.2085838

KEYWORDS: Optical lithography, Modulation, Light sources, Semiconducting wafers, Lithography, Wafer-level optics, Neodymium, Light, Polarization, Metrology

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Proceedings Article | 4 April 2014 Paper

Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner, Ivan Lalovic, Joost Bekaert

Proceedings Volume 9052, 905228 (2014) https://doi.org/10.1117/12.2047449

KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Modulation, Lithography, Metrology, Wafer-level optics, Scatterometry, Double patterning technology, Photomasks

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Proceedings Article | 31 March 2014 Paper

Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

R. Burdt, J. Thornes, T. Duffey, T. Bibby, R. Rokitski, E. Mason, J. Melchior, T. Aggarwal, D. Haran, J. Wang, G. Rechtsteiner, M. Haviland, D. Brown

Proceedings Volume 9052, 90522K (2014) https://doi.org/10.1117/12.2048082

KEYWORDS: Light sources, Semiconducting wafers, Lithography, Semiconductors, Scanners, Light, Optical amplifiers, Switching, Optical lithography, Near field optics

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Proceedings Article | 12 April 2013 Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

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Showing 5 of 13 publications

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