Dr. Georg Pawlowski
Engineer/Technical Director at Merck Electronics Ltd
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 905123 (2014) https://doi.org/10.1117/12.2046311
KEYWORDS: Floods, Photoresist processing, Photoresist materials, Thermal effects, Lithography, Materials processing, Image processing, Semiconducting wafers, Resolution enhancement technologies, Critical dimension metrology

Proceedings Article | 27 March 2014 Paper
Jin Li, Ide Yasuaki, Shigemasa Nakasugi, Motoki Misumi, Hiroshi Yanagita, Fumihiro Suzuki, Georg Pawlowski, JoonYeon Cho, Huirong Yao, Takanori Kudo, Munirathna Padmanaban, YoungJun Her, Yi Cao
Proceedings Volume 9051, 905117 (2014) https://doi.org/10.1117/12.2046237
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photons, Electrons, Optical lithography, Lithography, Printing, Polymers, Photomasks, Absorbance

Proceedings Article | 29 March 2013 Paper
Munirathna Padmanaban, JoonYeon Cho, Takanori Kudo, Salem Mullen, Huirong Yao, Go Noya, Yuriko Matsuura, Yasuaki Ide, Jin Li, Georg Pawlowski
Proceedings Volume 8682, 868215 (2013) https://doi.org/10.1117/12.2013363
KEYWORDS: Extreme ultraviolet, Electron beam lithography, Line width roughness, Semiconducting wafers, Extreme ultraviolet lithography, Polymers, Coating, Absorption, Etching, Photoresist materials

Proceedings Article | 26 March 2013 Paper
Go Noya, Kazuma Yamamoto, Naoki Matsumoto, Yukie Takemura, Maki Ishii, Yoshihiro Miyamoto, Masahiro Ishii, Tatsuro Nagahara, Georg Pawlowski
Proceedings Volume 8680, 86802E (2013) https://doi.org/10.1117/12.2012077
KEYWORDS: Semiconducting wafers, Image processing, Lithography, Photoresist processing, 193nm lithography, Resolution enhancement technologies, Yield improvement, Optical lithography, Materials processing, Deep ultraviolet

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72730J (2009) https://doi.org/10.1117/12.816044
KEYWORDS: Polymers, Copper, Silicon, Coating, Photoresist processing, Gold, Fourier transforms, Plating, Chemistry, Semiconducting wafers

Proceedings Article | 26 March 2008 Paper
Chunwei Chen, Robert Plass, Edward Ng, Sam Lee, Stephen Meyer, Georg Pawlowski, Rozalia Beica
Proceedings Volume 6923, 69233E (2008) https://doi.org/10.1117/12.773986
KEYWORDS: Photoresist materials, Electroplating, Copper, Lithography, Semiconducting wafers, Photoresist developing, Solids, Plating, Gold, Thin film coatings

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69233I (2008) https://doi.org/10.1117/12.773965
KEYWORDS: Copper, Semiconducting wafers, Photoresist processing, Electroplating, Plating, Thin film coatings, Oxygen, Lithography, Silicon, Chemistry

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6519, 65192M (2007) https://doi.org/10.1117/12.711621
KEYWORDS: Copper, Diffusion, Semiconducting wafers, Silicon, Coating, Polymers, Chemically amplified resists, Polymer thin films, Molecules, Fluorine

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6519, 65192E (2007) https://doi.org/10.1117/12.711601
KEYWORDS: Silica, Etching, Nanocomposites, Photoresist materials, Plasma etching, Nanoparticles, Plasma, Resistance, Deep reactive ion etching, Particles

Proceedings Article | 29 March 2006 Paper
Medhat Toukhy, Salem Mullen, Margareta Paunescu, Chunwei Chen, Stephen Meyer, Georg Pawlowski, Yoshio Murakami, Clifford Hamel
Proceedings Volume 6153, 61534H (2006) https://doi.org/10.1117/12.656595
KEYWORDS: Copper, Semiconducting wafers, Silicon, Plating, Electroplating, Photoresist processing, Chemistry, Polymers, Temperature metrology, Optical coatings

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601768
KEYWORDS: Thin film coatings, Lithography, Immersion lithography, Interferometry, Semiconducting wafers, Water, Refractive index, Contamination, Doping, Lithium

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600782
KEYWORDS: Photoresist materials, Semiconducting wafers, Immersion lithography, Systems modeling, Lithography, Interfaces, Diffusion, Photoresist developing, Coating, Data modeling

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600736
KEYWORDS: Fourier transforms, Reflectivity, Lithography, Etching, Bottom antireflective coatings, Multilayers, Antireflective coatings, Semiconducting wafers, Stereolithography, 193nm lithography

Proceedings Article | 24 July 2002 Paper
DongKwan Lee, Xiaoming Ma, William Lamanna, Georg Pawlowski
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474216
KEYWORDS: Photoresist materials, Lithography, Line edge roughness, Polymers, Deep ultraviolet, Manufacturing, Information operations, Standards development, Selenium, Nomenclature

Proceedings Article | 23 June 2000 Paper
Kayo Aramaki, T. Hamada, DongKwan Lee, Hiroshi Okazaki, Naoko Tsugama, Georg Pawlowski
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388360
KEYWORDS: Photomasks, Photoresist processing, Binary data, Silicon, Standards development, Photoresist materials, Fourier transforms, Critical dimension metrology, Lithography, Polymers

Proceedings Article | 23 June 2000 Paper
Seiya Masuda, Xiaoming Ma, G Noya, Georg Pawlowski
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388309
KEYWORDS: Line edge roughness, Polymers, Lithography, Standards development, Photoresist processing, Photoresist materials, Image processing, Inspection, Lithium, Picosecond phenomena

Proceedings Article | 11 June 1999 Paper
Koji Shimomura, Yoshimitsu Okuda, Hiroshi Okazaki, Yoshiaki Kinoshita, Georg Pawlowski
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350221
KEYWORDS: Polymers, Etching, Photoresist materials, Particles, Dry etching, Excimer lasers, Lithography, Manufacturing, Inspection, Electronics

Proceedings Article | 29 June 1998 Paper
Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Yoshino Nishiwaki, Georg Pawlowski, Hatsuyuki Tanaka
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312410
KEYWORDS: Deep ultraviolet, Etching, Lithography, Polymers, Reflectivity, Absorption, Photoresist materials, Silicon, Photoresist processing, Interfaces

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312453
KEYWORDS: Polymers, Lithography, Deep ultraviolet, Photoresist processing, Silicon, Photomasks, Semiconducting wafers, Image processing, Head-mounted displays, Scanning electron microscopy

Proceedings Article | 14 June 1996 Paper
Munirathna Padmanaban, Yoshiaki Kinoshita, N. Kawasaki, Hiroshi Okazaki, Satoru Funato, Georg Pawlowski
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241821
KEYWORDS: Reflectivity, Absorbance, Lithography, Deep ultraviolet, Absorption, Etching, Optical properties, Chemically amplified resists, Transparency, Polymers

Proceedings Article | 14 June 1996 Paper
Satoru Funato, N. Kawasaki, Yoshiaki Kinoshita, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, T. Yamamoto, Georg Pawlowski
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241816
KEYWORDS: Deep ultraviolet, Polymers, Lithography, Chemically amplified resists, Photoresist processing, Silicon, Reflectivity, Diffusion, Annealing, Molecules

Proceedings Article | 3 July 1995 Paper
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212768
KEYWORDS: Temperature metrology, Photomasks, Lithography, Optics manufacturing, Chemically amplified resists, Image processing, Manufacturing, Silicon, Scanning electron microscopy, Optical design

Proceedings Article | 16 May 1994 Paper
Hsiao-Yi Shih, Tung-Feng Yeh, Arnost Reiser, Ralph Dammel, Hans-Joachim Merrem, Georg Pawlowski
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175366
KEYWORDS: Glasses, Diffusion, Polymers, Ions, Solids, Interfaces, Polymer thin films, Silver, Molecules, Data communications

Proceedings Article | 16 May 1994 Paper
Walter Spiess, Thomas Lynch, Charles Le Cornec, Gary Escher, Yoshiaki Kinoshita, John Kochan, Takanori Kudo, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Setha Olson, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Klaus Przybilla, Horst Roeschert, Natusmi Suehiro, Francoise Vinet, Horst Wengenroth
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175402
KEYWORDS: Scanning electron microscopy, Deep ultraviolet, Lithography, Excimer lasers, Semiconducting wafers, Surface conduction electron emitter displays, Photomasks, Krypton, Laser applications, Absorbance

Proceedings Article | 16 May 1994 Paper
Munirathna Padmanaban, Yoshiaki Kinoshita, Takanori Kudo, Thomas Lynch, Seiya Masuda, Yuko Nozaki, Hiroshi Okazaki, Georg Pawlowski, Klaus Przybilla, Horst Roeschert, Walter Spiess, Natusmi Suehiro, Horst Wengenroth
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175392
KEYWORDS: Deep ultraviolet, Lithography, Scanning electron microscopy, Polymers, Absorption, Etching, Semiconducting wafers, Silver, Photoresist materials, Clean room processes

Proceedings Article | 15 September 1993 Paper
Horst Roeschert, Charlotte Eckes, Georg Pawlowski
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154769
KEYWORDS: Photoresist materials, Picture Archiving and Communication System, Absorbance, Lithography, Deep ultraviolet, Quantum efficiency, Image processing, Diffusion, Semiconducting wafers, Ultraviolet radiation

Proceedings Article | 15 September 1993 Paper
Horst Roeschert, Charlotte Eckes, Hajime Endo, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, Klaus Przybilla, Walter Spiess, Natusmi Suehiro, Horst Wengenroth, Georg Pawlowski
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154753
KEYWORDS: Photoresist materials, Semiconducting wafers, Polymers, Picture Archiving and Communication System, Lithography, Diffusion, Deep ultraviolet, Coating, Absorbance, Scanning electron microscopy

Proceedings Article | 15 September 1993 Paper
Klaus Przybilla, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Horst Roeschert, Walter Spiess, Natusmi Suehiro
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154803
KEYWORDS: Diffusion, Deep ultraviolet, Lithography, Photoresist materials, Etching, Photoresist processing, Polymers, Contamination, Excimer lasers, Image resolution

Proceedings Article | 15 September 1993 Paper
Tung-Feng Yeh, Arnost Reiser, Ralph Dammel, Georg Pawlowski, Horst Roeschert
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154792
KEYWORDS: Polymers, Solids, Diffusion, Semiconducting wafers, Mercury, Silver, Ions, Silicon, Standards development, Photoresist materials

Proceedings Article | 1 June 1992 Paper
Horst Roeschert, Ralph Dammel, Charlotte Eckes, K. Kamiya, Winfried Meier, Klaus Przybilla, Walter Spiess, Georg Pawlowski
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59757
KEYWORDS: Photoresist materials, Polymers, Deep ultraviolet, Lithography, Etching, Absorbance, Scanning electron microscopy, Photoresist developing, Photoresist processing, Dry etching

Proceedings Article | 1 June 1992 Paper
Horst Roeschert, Klaus Przybilla, Walter Spiess, Horst Wengenroth, Georg Pawlowski
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59724
KEYWORDS: Polymers, Remote sensing, Photoresist materials, Deep ultraviolet, Lithography, Photoresist processing, Polymer thin films, Optical properties, Absorption, Absorbance

Proceedings Article | 1 June 1992 Paper
Klaus Przybilla, Horst Roeschert, Georg Pawlowski
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59744
KEYWORDS: Polymers, Photoresist materials, Lithography, Resist chemistry, Deep ultraviolet, Chemistry, Hydrogen, Photoresist developing, Excimer lasers, Dry etching

Proceedings Article | 1 June 1992 Paper
Munirathna Padmanaban, Hajime Endo, Yoshio Inoguchi, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Yasuhiro Nakajima, Georg Pawlowski
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59755
KEYWORDS: Humidity, Semiconducting wafers, Photoresist processing, Chemically amplified resists, Image processing, Diffusion, Nitrogen, Coating, Process control, Polymers

Proceedings Article | 1 June 1991 Paper
Klaus Przybilla, Heinz Roeschert, Walter Spiess, Charlotte Eckes, Subhankar Chatterjee, Dinesh Khanna, Georg Pawlowski, Ralph Dammel
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46368
KEYWORDS: Polymers, Deep ultraviolet, Hydrogen, Lithography, Absorption, Ultraviolet radiation, Silver, Polymerization, Transparency, Standards development

Proceedings Article | 1 June 1991 Paper
Charlotte Eckes, Georg Pawlowski, Klaus Przybilla, Winfried Meier, Michel Madore, Ralph Dammel
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46388
KEYWORDS: Deep ultraviolet, X-rays, Floods, Lithography, Electron beam lithography, Semiconducting wafers, Diffusion, Etching, Dry etching, Photoresist processing

Proceedings Article | 1 June 1990 Paper
Georg Pawlowski, Thomas Sauer, Ralph Dammel, Douglas Gordon, William Hinsberg, Dennis McKean, Charlet Lindley, Hans-Joachim Merrem, Heinz Roeschert, Richard Vicari, C. Grant Willson
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20135
KEYWORDS: Polymers, Photoresist materials, Etching, Deep ultraviolet, Excimer lasers, Glasses, Lithography, Resistance, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 1 June 1990 Paper
Georg Pawlowski, Ralph Dammel, Charlet Lindley, Hans-Joachim Merrem, Heinz Roeschert, Juergen Lingnau
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20133
KEYWORDS: Photoresist materials, Deep ultraviolet, Photolysis, Semiconducting wafers, Lithography, Absorbance, Nitrogen, Quantum efficiency, Chemistry, Excimer lasers

Proceedings Article | 1 June 1990 Paper
Ralph Dammel, Charlet Lindley, Georg Pawlowski, Ude Scheunemann, Juergen Theis
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20134
KEYWORDS: Lithography, Etching, Photomasks, Plasma etching, Plasma, X-ray lithography, Polymers, Polymethylmethacrylate, Resistance, Chromium

Proceedings Article | 1 June 1990 Paper
Ralph Dammel, Charlet Lindley, Winfried Meier, Georg Pawlowski, Juergen Theis, Wolfgang Henke
Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20177
KEYWORDS: Optical lithography, Lithography, Deep ultraviolet, Photoresist processing, Diffraction, Image processing, Image resolution, Geometrical optics, Photomasks, Computer simulations

Showing 5 of 39 publications
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