Dr. Georg Soumagne Profile

Dr. Georg Soumagne

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 13 October 2021 Presentation + Paper

Presentation + Paper

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11854, 118540K (2021) https://doi.org/10.1117/12.2600714

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Plasma, Laser systems engineering, Extreme ultraviolet lithography, Light sources, Reflectivity, Laser development

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Proceedings Article | 21 September 2020 Poster + Presentation

Poster + Presentation

Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 11517, 1151717 (2020) https://doi.org/10.1117/12.2572689

KEYWORDS: Tin, Light sources, Mirrors, Magnetism, Extreme ultraviolet, Carbon dioxide lasers, Hydrogen, Chemical species, Pulsed laser operation, Reflectivity

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Proceedings Article | 20 September 2020 Presentation

Presentation

Update of >300W high power LPP-EUV source challenge for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Yoshifumi Ueno, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou, Hirokazu Hosoda, Hiroaki Tomuro, Shinji Nagai, Gouta Niimi, Takashi Suganuma

Proceedings Volume 11517, 115170Q (2020) https://doi.org/10.1117/12.2574707

KEYWORDS: Mirrors, Semiconductors, Extreme ultraviolet, Carbon dioxide lasers, Extreme ultraviolet lithography, Light sources, Magnetism, Magnetic semiconductors, Tin, Pulsed laser operation

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Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11323, 113230X (2020) https://doi.org/10.1117/12.2549905

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Mirrors, Tin, Plasma, Light sources, Extreme ultraviolet lithography, Reflectivity, Magnetism, Laser development

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Proceedings Article | 26 September 2019 Presentation + Paper

Presentation + Paper

Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11147, 1114705 (2019) https://doi.org/10.1117/12.2534147

KEYWORDS: Mirrors, Semiconductors, Reflectivity

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Yuta Takashima, Yoshifumi Ueno, Takayuki Yabu, Tsukasa Hori, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11147, 111471M (2019) https://doi.org/10.1117/12.2536397

KEYWORDS: Extreme ultraviolet, Light sources

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Proceedings Article | 6 June 2019 Presentation + Paper

Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10957, 1095716 (2019) https://doi.org/10.1117/12.2514033

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Mirrors, Tin, Plasma, Light sources, Laser development, Ions, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 12 October 2018 Presentation

Presentation

Long collector mirror lifetime demonstration around 100W average LP-EUV source for semiconductor high volume manufacturing (Conference Presentation)

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodema, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10809, 1080906 (2018) https://doi.org/10.1117/12.2502015

KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

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Proceedings Article | 3 October 2018 Paper

Paper

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356

KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

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Proceedings Article | 19 March 2018 Presentation + Paper

Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamatsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10583, 1058318 (2018) https://doi.org/10.1117/12.2299300

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2017 Presentation + Paper

Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10450, 104500Z (2017) https://doi.org/10.1117/12.2281129

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2015 Paper

Paper

Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 8 April 2011 Paper

Paper

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Tatsuya Yanagida, Hitoshi Nagano, Yasunori Wada, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi, Akira Endo

Proceedings Volume 7969, 79692T (2011) https://doi.org/10.1117/12.879189

KEYWORDS: Extreme ultraviolet, Tin, Particles, Carbon dioxide lasers, Plasma, Chemical species, Light sources, Mirrors, Magnetism, Laser irradiation

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Proceedings Article | 7 April 2011 Paper

Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

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Proceedings Article | 18 March 2009 Paper

Paper

Evaluation at the intermediate focus for EUV light source

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo

Proceedings Volume 7271, 727133 (2009) https://doi.org/10.1117/12.813494

KEYWORDS: Extreme ultraviolet, Mirrors, Carbon dioxide lasers, Light sources, Plasma, Tin, Optical filters, Extreme ultraviolet lithography, Reflectivity, Optical filtering

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 12 May 2008 Paper

Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 7005, 70052U (2008) https://doi.org/10.1117/12.782475

KEYWORDS: Tin, Magnetism, Plasma, Ions, Carbon dioxide lasers, Mirrors, Extreme ultraviolet, Light sources, Carbon dioxide, Nd:YAG lasers

Read Abstract +

Proceedings Article | 21 March 2008 Paper

Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 69212Z (2008) https://doi.org/10.1117/12.771817

KEYWORDS: Tin, Plasma, Magnetism, Carbon dioxide lasers, Ions, Mirrors, Silicon, Extreme ultraviolet, Gold, Statistical analysis

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Proceedings Article | 21 March 2008 Paper

Paper

Sn droplet target development for laser produced plasma EUV light source

Masaki Nakano, Takayuki Yabu, Hiroshi Someya, Tamotsu Abe, Georg Soumagne, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692130 (2008) https://doi.org/10.1117/12.771820

KEYWORDS: Tin, Extreme ultraviolet, Electrodes, Laser development, Plasma, Light sources, Laser irradiation, Chemical species, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 20 March 2008 Paper

Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 13 September 2007 Paper

Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6703, 670309 (2007) https://doi.org/10.1117/12.732254

KEYWORDS: Gas lasers, Tin, Carbon monoxide, Extreme ultraviolet, Plasma, Pulsed laser operation, Carbon dioxide lasers, Light sources, Magnetism, Ions

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Proceedings Article | 21 March 2007 Paper

Paper

Small field exposure tool (SFET) light source

Tamotsu Abe, Takashi Suganuma, Masato Moriya, Takayuki Yabu, Takeshi Asayama, Hiroshi Someya, Yoshifumi Ueno, Georg Soumagne, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6517, 65173C (2007) https://doi.org/10.1117/12.711241

KEYWORDS: Plasma, Xenon, Light sources, Extreme ultraviolet, Mirrors, Optical filters, Actuators, Laser development, Extreme ultraviolet lithography, High power lasers

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Proceedings Article | 21 March 2007 Paper

Paper

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, Masaki Nakano, Hiroshi Komori, Georg Soumagne, Akira Endo, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65173B (2007) https://doi.org/10.1117/12.711226

KEYWORDS: Tin, Gas lasers, Ions, Plasma, Carbon monoxide, Nd:YAG lasers, Extreme ultraviolet, Glasses, Solids, Mirrors

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Proceedings Article | 19 March 2007 Paper

Paper

Laser-produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65170O (2007) https://doi.org/10.1117/12.711097

KEYWORDS: Gas lasers, Carbon monoxide, Tin, Extreme ultraviolet, Plasma, Pulsed laser operation, Nd:YAG lasers, Light sources, Optical amplifiers, Ions

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Proceedings Article | 24 March 2006 Paper

Paper

KrF laser driven xenon plasma light source of a small-field exposure tool

Tamotsu Abe, Masato Moriya, Hiroshi Someya, Georg Soumagne, Takashi Suganuma, Takayuki Watanabe, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6151, 61513T (2006) https://doi.org/10.1117/12.656228

KEYWORDS: Light sources, Xenon, Plasma, Extreme ultraviolet lithography, Laser development, Mirrors, Lithography, Optical filters, Pulsed laser operation, Liquids

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Proceedings Article | 23 March 2006 Paper

Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 6 May 2005 Paper

Paper

Model of neutralization of highly ionized Xe generated by laser-produced plasma

Iwao Nishiyama, Hiroshi Komori, Georg Soumagne

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601449

KEYWORDS: Ions, Xenon, Plasma, Extreme ultraviolet, Chemical species, Plasma generation, Light sources, Magnetism, Sensors, Extreme ultraviolet lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Magnetic field ion mitigation for EUV light sources

Hiroshi Komori, Yousuke Imai, Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Akira Endo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600360

KEYWORDS: Ions, Magnetism, Xenon, Plasma, Extreme ultraviolet, Mirrors, Light sources, Pulsed laser operation, Laser energy, Nd:YAG lasers

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Proceedings Article | 20 September 2004 Paper

Paper

Measurements of energy distribution functions of xenon ions from laser-produced plasmas for lithography

Georg Soumagne, Tamotsu Abe, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Akira Endo

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.545933

KEYWORDS: Ions, Xenon, Plasmas, Mirrors, Picosecond phenomena, Microchannel plates, Pulsed laser operation, Reflectivity, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 10 June 2004 Paper

Paper

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5482, (2004) https://doi.org/10.1117/12.558598

KEYWORDS: Plasmas, Picosecond phenomena, Pulsed laser operation, Aluminum, Extreme ultraviolet, Tin, Copper, X-ray sources, Spectrographs, Tungsten

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Proceedings Article | 20 May 2004 Paper

Paper

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Akira Endo, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534060

KEYWORDS: Ions, Xenon, Plasmas, Magnetism, Mirrors, Extreme ultraviolet, Reflectivity, Microchannel plates, Light sources, Surface roughness

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Proceedings Article | 20 May 2004 Paper

Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 7 January 2004 Paper

Paper

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.503434

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Ions, Liquids, Absorption, Mirrors, Light sources, Data modeling, Pulsed laser operation

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Proceedings Article | 18 November 2003 Paper

Paper

EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.541149

KEYWORDS: Plasma, Picosecond phenomena, Aluminum, Tin, Copper, Pulsed laser operation, Extreme ultraviolet, Solids, Light sources, Laser energy

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Proceedings Article | 16 June 2003 Paper

Paper

Development of a liquid-jet laser-produced plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Yukihiko Sugimoto, Hiroshi Someya, Hideo Hoshino, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483598

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Extreme ultraviolet lithography, Plasma, Laser systems engineering, Oscillators, Liquids, Amplifiers, Temperature metrology

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Proceedings Article | 14 September 2001 Paper

Paper

Long-run-time performance characteristics of a line-selected 2-kHz F2 laser for optical microlithography

Georg Soumagne, Shinji Nagai, Naoto Hisanaga, Shinobu Nanzai, Yoshinori Ochiishi, Ayako Ohbu, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435647

KEYWORDS: Pulsed laser operation, Laser stabilization, Laser resonators, Optical lithography, Laser applications, Laser optics, Laser development, Fluorine, Resonators, Prisms

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Proceedings Article | 1 October 1991 Paper

Paper

Determination of the electron beam velocity in a gyrotron by means of Thomson scattering

G. Soumagne

Proceedings Volume 1576, 15761U (1991) https://doi.org/10.1117/12.2297779

KEYWORDS: Electron beams, Thomson scattering, Laser scattering, Light scattering, Scattering, Plasmas, Energy conversion efficiency, Diagnostics, Plasma physics, Temperature metrology

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Showing 5 of 38 publications

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