Spin spray and bath immersion systems are still the competing technologies for mask process. The preference for one or the other is largely dependent on factor such as performance, size, throughput, and cost. This paper focuses on the process optimization of the immersion bath technology in relation to the performance such as particulate soft defects, EAPSM optical parameter change, and antireflective layer reflectivity.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.