Dr. Guido Salmaso Profile

Dr. Guido Salmaso

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 28 April 2023 Presentation + Paper

0.33 NA EUV systems for high volume manufacturing

Christophe Smeets, Nico Benders, Frank Bornebroek, Joe Carbone, Roderik van Es, Arthur Minnaert, Guido Salmaso, Stuart Young

Proceedings Volume 12494, 1249406 (2023) https://doi.org/10.1117/12.2658046

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Semiconducting wafers, Carbon, Wavefront errors, Wavefront aberrations, Semiconductors, Scanners

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Proceedings Article | 16 November 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik Van Es

Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 13 June 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik van Es, Roelof de Graaf

Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220

KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

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Proceedings Article | 26 May 2022 Presentation + Paper

High-transmission EUV pellicles supporting >400W source power

Mark van de Kerkhof, Alexander Klein, Paul Vermeulen, Ties van der Woord, Inci Donmez, Guido Salmaso, Raymond Maas

Proceedings Volume 12051, 120510B (2022) https://doi.org/10.1117/12.2614262

KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Composites, Metals, Extreme ultraviolet lithography, Semiconducting wafers, Reticles, Particles, Manufacturing

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Proceedings Article | 29 September 2021 Presentation

A new generation EUV pellicle to enable future EUV lithographic nodes at enhanced productivity

Guido Salmaso, Raymond Maas

Proceedings Volume 11854, 118540R (2021) https://doi.org/10.1117/12.2600854

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Transmittance, Semiconducting wafers, Standards development, Scanners

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Proceedings Article | 27 June 2019 Paper

ASML NXE pellicle update

Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso

Proceedings Volume 11178, 1117806 (2019) https://doi.org/10.1117/12.2536344

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Reticles, Particles, Reflection, Scanners, Photomasks

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Proceedings Article | 31 August 2009 Paper

Technologies for manufacturing of high angular resolution multilayer coated optics for future new hard x-ray missions: a status report

G. Borghi, D. Vernani, E. Marchi Boscolo, O. Citterio, G. Grisoni, J. Kools, F. Marioni, A. Orlandi, A. Ritucci, M. Rossi, G. Salmaso, G. Valsecchi, S. Basso, G. Pareschi, D. Spiga, G. Tagliaferri, B. Negri

Proceedings Volume 7437, 74370W (2009) https://doi.org/10.1117/12.828191

KEYWORDS: Mirrors, Multilayers, Optics manufacturing, Hard x-rays, Nickel, Coating, X-ray optics, Manufacturing, Reflectivity, Astronomy

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Proceedings Article | 30 April 2009 Paper

Enabling deposition of hard x-ray reflective coatings as an industrial manufacturing process

Denis Garoli, Enrico Boscolo Marchi, Valentina Mattarello, Juri Bertoli, Guido Salmaso, Jacques Kools, Daniele Spiga, Giampiero Tagliaferri, Giovanni Pareschi

Proceedings Volume 7360, 73600U (2009) https://doi.org/10.1117/12.820428

KEYWORDS: Multilayers, Reflectivity, Silicon, Space telescopes, Plasma, Manufacturing, Telescopes, Mirrors, Hard x-rays, Reflector telescopes

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Proceedings Article | 18 March 2009 Paper

Design and fabrication considerations of EUVL collectors for HVM

G. Bianucci, G. L. Cassol, J. Kools, M. Prea, G. Salmaso, G. Valsecchi, F. Zocchi, D. Bolshukhin, M. Schürmann, G. Schriever, A. Mader, P. Zink

Proceedings Volume 7271, 72710C (2009) https://doi.org/10.1117/12.813652

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Ruthenium, Extreme ultraviolet lithography, Optics manufacturing, EUV optics, Optical design, Integrated optics, Solids

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Proceedings Article | 4 February 2004 Paper

Grazing-incidence reflectivity of Si-Au coatings for optics with high thermal load

Luca Poletto, Giampiero Naletto, Giuseppe Tondello, Alessandro Patelli, Valentino Rigato, Guido Salmaso, Davide Silvestrini, Juan Larruquert, Jose Antonio Mendez

Proceedings Volume 5171, (2004) https://doi.org/10.1117/12.522983

KEYWORDS: Reflectivity, Extreme ultraviolet, Gold, Silicon, Mirrors, Optical coatings, Telescopes, Sun, Thermography, Spectroscopy

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