Dr. Guillaume Mernier Profile

Dr. Guillaume Mernier

R&D Engineer at ASML Netherlands BV

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Publications (2)

Proceedings Article | 26 May 2022 Presentation + Paper

Impact of mask variations on CD and placement in resist: local versus global effects

Guillaume Mernier, Danielle Palmen, Nicole Schoumans, Marieke van Veen, Rasmus Nielsen, Jan Baselmans

Proceedings Volume 12051, 1205104 (2022) https://doi.org/10.1117/12.2613333

KEYWORDS: Photomasks, Computer simulations, Reticles, Deep ultraviolet, Convolution

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Proceedings Article | 15 March 2016 Paper

Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections

Michael Kubis, Rich Wise, Liesbeth Reijnen, Katja Viatkina, Patrick Jaenen, Melisa Luca, Guillaume Mernier, Charlotte Chahine, David Hellin, Benjamin Kam, Daniel Sobieski, Johan Vertommen, Jan Mulkens, Mircea Dusa, Girish Dixit, Nader Shamma, Philippe Leray

Proceedings Volume 9780, 978007 (2016) https://doi.org/10.1117/12.2220591

KEYWORDS: Critical dimension metrology, Etching, Lithography, Optical lithography, Scanners, Process control, Logic, Scatterometry, Photomasks, Plasma etching, Metrology

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