Dr. Günther G. Ruhl Profile

Dr. Günther G. Ruhl

Engineer at Infineon Technologies AG

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Author

Publications (13)

Proceedings Article | 6 December 2004 Paper

Numerical and experimental study of oxide growth on EUV mask capping layers

Eric Cotte, Christian Holfeld, Uwe Dersch, Guenther Ruhl, Jan Perlich

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569276

KEYWORDS: Reflectivity, Silicon, Oxides, Data modeling, Extreme ultraviolet, Interfaces, Performance modeling, Inspection, Silica, Photomasks

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Proceedings Article | 2 June 2004 Paper

Optimized processes and absorber-stack materials for EUV masks

Josef Mathuni, Jenspeter Rau, Frank-Michael Kamm, Guenther Ruhl, Ch. Holfeld, Florian Letzkus, C. Koepernik, Joerg Butschke

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568010

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Chromium, Tantalum, Critical dimension metrology, Materials processing, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers

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Proceedings Article | 2 June 2004 Paper

Investigation of Cr etch chamber seasoning

Pavel Nesladek, Guenther Ruhl, Marcel Kristlib

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568015

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Plasma, Plasma etching, Photoresist materials, Optical lithography, Ceramics, Carbon monoxide

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Proceedings Article | 28 August 2003 Paper

Improvement of chrome CDU by optimizing focus ring design

Rex Anderson, Guenther Ruhl, Pavel Nesladek, Gerhard Prechtl, Winfried Sabisch, Alfred Kersch, Melisa Buie

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504199

KEYWORDS: Etching, Chlorine, Critical dimension metrology, Oxygen, Photomasks, Plasma etching, Plasma, Data centers, Chromium, Manufacturing

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Proceedings Article | 28 August 2003 Paper

Development of a plasma etch process for TaN absorber patterning on EUV masks

Guenther Ruhl, Josef Mathuni, Dirk Knobloch, Frank-Michael Kamm, Jenspeter Rau, Florian Letzkus, Reinhard Springer

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504243

KEYWORDS: Etching, Polymers, Plasma etching, Photomasks, Plasma, Extreme ultraviolet, Scanning electron microscopy, Photoresist processing, Chromium, Diffractive optical elements

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Proceedings Article | 27 December 2002 Paper

Study of the role of Cl2, O2, and He in the chrome etch process with optical emission spectroscopy

Rex Anderson, Guenther Ruhl, Nicole Sandlin, Melisa Buie

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467849

KEYWORDS: Etching, Chlorine, Chromium, Plasma, Oxygen, Plasma etching, Emission spectroscopy, Carbon monoxide, Photomasks, Scanning electron microscopy

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Proceedings Article | 1 August 2002 Paper

Microwave plasma resist stripping for mask manufacturing

Guenther Ruhl, Pavel Nesladek, Astrid Boesl

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476956

KEYWORDS: Plasma, Etching, Photoresist materials, Chromium, Microwave radiation, Oxides, Polymers, Plasma etching, Photomasks, Manufacturing

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Proceedings Article | 11 March 2002 Paper

Extended chamber matching and repeatability study for chrome etch

Yi-Chiau Huang, Melisa Buie, Brigitte Stoehr, Alex Buxbaum, Guenther Ruhl

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458344

KEYWORDS: Etching, Photoresist materials, Photomasks, Chlorine, Chromium, Plasma, Manufacturing, Calibration, Optics manufacturing, Dry etching

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Proceedings Article | 11 March 2002 Paper

Endpoint solution for photomask chrome loads down to 0.25%

Melisa Buie, Brigitte Stoehr, Alex Buxbaum, Guenther Ruhl

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458342

KEYWORDS: Etching, Photomasks, Critical dimension metrology, Chromium, Photoresist materials, Emission spectroscopy, Plasma, Plasma etching, Quartz, Chlorine

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Proceedings Article | 5 September 2001 Paper

Development and characterization of a new plasma etching process for mask manufacturing

Frank Erber, Guenther Ruhl, C. Ebi, Ralf Dietrich, Josef Mathuni, Pavel Nesladek

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438358

KEYWORDS: Etching, Photomasks, Plasma etching, Manufacturing, Dry etching, Critical dimension metrology, Photoresist processing, Plasma, Photoresist materials, Scanning electron microscopy

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Proceedings Article | 22 January 2001 Paper

Chrome dry etch process characterization using surface nanoprofiling

Guenther Ruhl, Ralf Dietrich, Ralf Ludwig, Norbert Falk, Troy Morrison, Brigitte Stoehr

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410753

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Helium, Oxygen, Diffractive optical elements, Photoresist materials, Photoresist processing, Sensors, Profiling

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Proceedings Article | 5 July 2000 Paper

Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Christoph Friedrich, Leonhard Mader, Andreas Erdmann, Steffen List, Ronald Gordon, Christian Kalus, Uwe Griesinger, Rainer Pforr, Josef Mathuni, Guenther Ruhl, Wilhelm Maurer

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388969

KEYWORDS: Photomasks, Quartz, Etching, Chromium, Phase shifts, Critical dimension metrology, Picosecond phenomena, Finite-difference time-domain method, Semiconducting wafers, Lithography

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Proceedings Article | 30 December 1999 Paper

Control methodology of off-target for varying pattern densities with chrome dry etch

Juergen Hochmuth, Guenther Ruhl, Thomas Coleman

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373324

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photoresist processing, Photomasks, Plasma etching, Data modeling, Diffractive optical elements, Plasma, Helium

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Showing 5 of 13 publications

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