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Hajime Furutani
Research Engineer at FUJIFILM Corp
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Publications (5)
Proceedings Article | 25 May 2022 Presentation + Paper
Improving polymethacrylate EUV resists with TiO2 area-selective deposition
Proceedings Volume 12055, 120550C (2022) https://doi.org/10.1117/12.2613815
KEYWORDS: Polymers, Atomic layer deposition, Extreme ultraviolet lithography, Titanium dioxide, Surface roughness, Surface properties, Chemically amplified resists
Proceedings Article | 13 March 2018 Paper
Novel EUV resist materials for 7 nm node and beyond
Hajime Furutani, Michihiro Shirakawa, Wataru Nihashi, Kyohei Sakita, Hironori Oka, Mitsuhiro Fujita, Tadashi Omatsu, Toru Tsuchihashi, Nishiki Fujimaki, Toru Fujimori
Proceedings Volume 10586, 105860G (2018) https://doi.org/10.1117/12.2297076
KEYWORDS: Absorption, Polymers, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Polymer thin films, Semiconducting wafers, Photons
Proceedings Article | 16 October 2017 Presentation
Recent progress of CAR materials for EUV lithography (Conference Presentation)
Toru Fujimori, Hajime Furutani, Michihiro Shirakawa, Wataru Nihashi, Toru Tsuchihashi
Proceedings Volume 10450, 104500O (2017) https://doi.org/10.1117/12.2280303
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Lithography, Chemistry, Metals, Line width roughness, Absorption, Stochastic processes, Contamination
Proceedings Article | 27 March 2017 Presentation + Paper
Challenges and progress in low defectivity for advanced ArF and EUV lithography processes using surface localized material technology
Michihiro Shirakawa, Hideaki Tsubaki, Hajime Furutani, Wataru Nihashi, Naohiro Tango, Kazuhiro Marumo, Kei Yamamoto, Hidenori Takahashi, Akiyoshi Goto, Mitsuhiro Fujita
Proceedings Volume 10146, 101460E (2017) https://doi.org/10.1117/12.2257956
KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Image processing, Immersion lithography, Chemically amplified resists, High volume manufacturing, Photomasks, Scanners, Polymers, Research management, Semiconducting wafers, Fluorine, Coating
Proceedings Article | 20 March 2015 Paper
Advanced patterning approaches based on negative-tone development (NTD) process for further extension of 193nm immersion lithography
Michihiro Shirakawa, Naoki Inoue, Hajime Furutani, Kei Yamamoto, Akiyoshi Goto, Mitsuhiro Fujita
Proceedings Volume 9425, 942509 (2015) https://doi.org/10.1117/12.2085744
KEYWORDS: Optical lithography, Polymers, Electroluminescence, Diffusion, Lithography, Semiconducting wafers, Immersion lithography, Photoresist processing, Research management, Scanning electron microscopy
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