Mr. Hajime Kawano Profile

Hajime Kawano

at Hitachi High-Tech Corp

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 10 April 2024 Poster + Paper

Study on a charging control method with a high current and large field of view

N. Terao, T. Yokosuka, H. Kotsuji, K. Shiraishi, H. Kawano

Proceedings Volume 12955, 1295520 (2024) https://doi.org/10.1117/12.3007173

KEYWORDS: Electric fields, Selenium, Monte Carlo methods, Tunable filters, Statistical analysis, Scanning electron microscopy, Inspection, Sensors, Semiconductors, Scattering

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SPIE Journal Paper | 6 April 2019

Influence of e-beam aperture angle on critical dimensions-scanning electron microscopes measurements for high aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

JM3, Vol. 18, Issue 02, 021204, (April 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021204

KEYWORDS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection

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Proceedings Article | 13 March 2018 Paper

Influence of e-beam aperture angle on CD-SEM measurements for high-aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

Proceedings Volume 10585, 105851A (2018) https://doi.org/10.1117/12.2296756

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Cadmium, Silicon, Critical dimension metrology, Spatial resolution, Optical simulations, 3D metrology, Semiconductors, Laser scattering

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SPIE Journal Paper | 29 June 2017

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

JM3, Vol. 16, Issue 02, 024004, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.024004

KEYWORDS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering

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Proceedings Article | 28 March 2017 Paper

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

Proceedings Volume 10145, 101451K (2017) https://doi.org/10.1117/12.2257205

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Semiconductors, Logic, Logic devices, 3D metrology, Process control, Electrons, Selenium, Silicon, Critical dimension metrology, Image filtering

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Proceedings Article | 28 March 2017 Presentation + Paper

SEM imaging capability for advanced nano-structures and its application to metrology

Makoto Suzuki, Uki Ikeda, Yuji Kasai, Yuzuru Mizuhara, Takanori Kishimoto, Ichiro Tachibana, Naomasa Suzuki, Hajime Kawano

Proceedings Volume 10145, 101451L (2017) https://doi.org/10.1117/12.2257793

KEYWORDS: Electrons, Scanning electron microscopy, Metrology, Signal detection, Semiconductors, Inspection, Sensors, Process control, Semiconductor manufacturing, Manufacturing, Signal generators, 3D metrology, 3D acquisition, Copper, Dielectrics

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Proceedings Article | 6 December 2004 Paper

Advanced CD control technologies for EB mask writer

Hajime Kawano, Yasuhiro Kadowaki, Kazui Mizuno, Hiroyuki Ito

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569317

KEYWORDS: Critical dimension metrology, Photomasks, Scattering, Error analysis, Electron beam lithography, Lithography, Laser scattering, Electron beams, Control systems, Semiconductors

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Proceedings Article | 20 August 2004 Paper

Recent CD accuracy improvements for HL-7000M

Zhigang Wang, Hidetoshi Satoh, Hiroyuki Ito, Yasunari Sohda, Hiroya Ohta, Hajime Kawano, Yasuhiro Kadowaki, Kazui Mizuno, Takashi Matsuzaka

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557807

KEYWORDS: Optical proximity correction, Vestigial sideband modulation, Critical dimension metrology, Calibration, Photomasks, Optical simulations, Data conversion, Manufacturing, Electron beams, Optics manufacturing

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Proceedings Article | 17 December 2003 Paper

Improved image placement performance of HL-7000M

Masaomi Tanaka, Hiroyuki Ito, Hiroyuki Takahashi, Kazuyoshi Oonuki, Yasuhiro Kadowaki, Hidetoshi Sato, Hajime Kawano, Zhigang Wang, Kazui Mizuno, Genya Matsuoka

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518005

KEYWORDS: Electrodes, Monochromatic aberrations, Photomasks, Optical design, Electron beams, Semiconductors, Electromagnetism, Metrology, Lithography, Optical proximity correction

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Proceedings Article | 28 August 2003 Paper

Technological capability and future enhanced performance of HL-7000M

Masaomi Tanaka, Suyo Asai, H. Kawano, Ken Iizumi, Kazuyoshi Oonuki, Hiroyuki Takahashi, Hidetoshi Sato, Rikio Tomiyoshi, Kazui Mizuno, Genya Matsuoka, Hiroya Ohta

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504275

KEYWORDS: Computed tomography, Optical proximity correction, Beam shaping, Data processing, Critical dimension metrology, Optical design, Reticles, Photomasks, Electron beams, Electron beam lithography

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Showing 5 of 10 publications

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