Mr. Harald Höller-Lugmayr Profile

Harald Höller-Lugmayr

at IMS Nanofabrication GmbH

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Author

Publications (2)

Proceedings Article | 29 September 2023 Paper

New multi-beam mask data preparation method for EUV high volume data

Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji

Proceedings Volume 12915, 129150D (2023) https://doi.org/10.1117/12.2683168

KEYWORDS: Extreme ultraviolet, Design and modelling, Electronic design automation, Algorithm development, Mathematical optimization, Data conversion, Product engineering, Optical proximity correction, Nanofabrication, Lithography

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Proceedings Article | 31 October 2022 Poster

Progress of multi-beam curvilinear mask writing

Christof Zillner, Jakub Jerabek, Amir Moqanaki, Harald Höller-Lugmayr, Elmar Platzgummer

Proceedings Volume PC12293, PC122930M (2022) https://doi.org/10.1117/12.2643253

KEYWORDS: Photomasks, Extreme ultraviolet, Data storage, Photomask technology, Optical lithography, Information technology, Explosives

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