According to the request for large-scale and high-efficiency transmission grating for astronomical ground-based telescope spectrographs, we report a method to control the duty cycle during the fabrication of deep-etched grating on fused silica substrate by holograph and ion-beam etching simply and conveniently. Simulation shows that 98% diffraction efficiency is achieved under Littrow conditions when groove depth is about 830nm, ridge width is about 240nm (duty cycle is about 0.60) at a wavelength of 400nm. In this work, we successfully manufactured serval gratings with different duty cycle controlled by exposure dose and thickness of chromium layer on the photoresist mask and achieved a high depth-to-width ratio deep-etched grating with the Cr-photoresist double mask at optimal grating period and groove depth for efficiency based on simulation results. It lays an essential foundation for the realization of large-area deep etching grating, which can be used in huge telescopes in the future.
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