Mr. Hideo Tsuchiya Profile

Hideo Tsuchiya

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 23 October 2015 Paper

DUV inspection tool application for beyond optical resolution limit pattern

Hiromu Inoue, Nobutaka Kikuiri, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Takashi Hirano, Ryoji Yoshikawa

Proceedings Volume 9635, 96350R (2015) https://doi.org/10.1117/12.2197890

KEYWORDS: Inspection, Deep ultraviolet, Optical inspection, Photomasks, Nanoimprint lithography, Optical resolution, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection

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Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

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Proceedings Article | 19 May 2011 Paper

Practical mask inspection system with printability and pattern priority verification

Hideo Tsuchiya, Fumio Ozaki, Kenichi Takahara, Takafumi Inoue, Nobutaka Kikuiri

Proceedings Volume 8081, 80810D (2011) https://doi.org/10.1117/12.899487

KEYWORDS: Photomasks, Inspection, Defect detection, Image processing, Computing systems, Computer simulations, Source mask optimization, Computational lithography, Semiconducting wafers, Electronics

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Proceedings Article | 25 May 2010 Paper

Mask inspection system with variable sensitivity and printability verification function

Takafumi Inoue, Kenichi Takahara, Hideo Tsuchiya, Masakazu Tokita, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7748, 77481G (2010) https://doi.org/10.1117/12.864415

KEYWORDS: Photomasks, Inspection, Defect detection, Semiconducting wafers, Data conversion, Image sensors, Databases, Image transmission, Source mask optimization

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Proceedings Article | 16 April 2010 Paper

Mask data rank and printability verification function of mask inspection system

Kenichi Takahara, Masakazu Tokita, Hideo Tsuchiya, Masaki Yamabe, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412

KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

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Proceedings Article | 23 September 2009 Paper

Printability verification function of mask inspection system

Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, Nobutaka Kikuiri

Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739

KEYWORDS: Inspection, Photomasks, Lithography, Defect detection, Image transmission, Semiconducting wafers, SRAF, Optical inspection, Telecommunications, Sensors

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Proceedings Article | 23 September 2009 Paper

Defect printability analysis by lithographic simulation from high resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

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Proceedings Article | 11 May 2009 Paper

A study of mask inspection method with pattern priority and printability check

Masakazu Tokita, Hideo Tsuchiya, Takafumi Inoue, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7379, 73792A (2009) https://doi.org/10.1117/12.824324

KEYWORDS: Inspection, Photomasks, Image processing, Defect detection, Data processing, Semiconducting wafers, Image sensors, Analytical research, Interfaces, Defect inspection

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Proceedings Article | 11 May 2009 Paper

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288

KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution

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Proceedings Article | 17 October 2008 Paper

Flexible sensitivity inspection with TK-CMI software for criticality-awareness

Frank Driessen, Jamila Gunawerdana, Yakuko Saito, Hideo Tsuchiya, Yoshitake Tsuji

Proceedings Volume 7122, 712222 (2008) https://doi.org/10.1117/12.803593

KEYWORDS: Inspection, Photomasks, Defect detection, Optical proximity correction, Data processing, Defect inspection, Data conversion, Manufacturing, Mask making, Databases

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Proceedings Article | 19 May 2008 Paper

Die-to-database mask inspection with variable sensitivity

Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, Tadao Inoue

Proceedings Volume 7028, 70282I (2008) https://doi.org/10.1117/12.793088

KEYWORDS: Inspection, Photomasks, Defect detection, Data conversion, Algorithm development, Databases, Optical proximity correction, Multilayers, Analytical research, Semiconductors

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Showing 5 of 11 publications

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