Mr. Hitoshi Handa Profile

Hitoshi Handa

at Fujitsu Semiconductor Ltd

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Author

Publications (10)

Proceedings Article | 1 November 2007 Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proceedings Volume 6730, 673045 (2007) https://doi.org/10.1117/12.751244

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

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Proceedings Article | 20 May 2006 Paper

Advanced process control of mask dry-etching using RF sensor

Hitoshi Handa, Satoshi Yamauchi, Koji Hosono, Hiroshi Maruyama, Daisuke Nakamura, Toshifumi Yokoyama, Akihiko Naito

Proceedings Volume 6283, 62830D (2006) https://doi.org/10.1117/12.681740

KEYWORDS: Etching, Chromium, Plasma, Sensors, Photomasks, Critical dimension metrology, Process control, Computer simulations, Oxygen, Phase shifts

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Proceedings Article | 17 December 2003 Paper

Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node

Hitoshi Handa, Satoshi Yamauchi, Hiroshi Maruyama, Satoshi Ishimoto, Makoto Kosugi, Yutaka Miyahara, Toshifumi Uryu, Toshifumi Yokoyama, Akihiko Naito

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518337

KEYWORDS: Sensors, Etching, Reticles, Plasma, Critical dimension metrology, Signal detection, Chromium, Process control, Resistance, Error analysis

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Proceedings Article | 27 December 2002 Paper

Process bias control with thin Cr film blanks for 90-nm-node reticle fabrication

Yukihiro Sato, Hitoshi Handa, Yasuyuki Kushida, Satoru Asai, Hiroshi Maruyama, Yutaka Miyahara, Minoru Naito, Ryugo Hikichi, Yoji Kawasaki, Hiroyuki Miyashita, Shigeru Noguchi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467497

KEYWORDS: Etching, Chromium, Reticles, Thin films, Dry etching, Critical dimension metrology, Lithography, Semiconducting wafers, Process control, Control systems

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Proceedings Article | 5 September 2001 Paper

Reticle cleaning process for 130-nm lithography and beyond

Hitoshi Handa, Masumi Takahashi, Hisatsugu Shirai

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438393

KEYWORDS: Particles, Deep ultraviolet, Reticles, Quartz, Chromium, Contamination, Lithography, Inspection, Ions, Photomasks

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Proceedings Article | 22 January 2001 Paper

Investigations of CD variation in Cr dry etching process

Hitoshi Handa, Satoshi Yamauchi, Kouji Hosono, Hisatsugu Shirai

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410731

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photoresist processing, Reticles, Wet etching, Chlorine gas, Magnetism, Reactive ion etching

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Proceedings Article | 19 July 2000 Paper

Improvement of Cr dry etching characteristics with the MERIE system

Hitoshi Handa, Satoshi Yamauchi, Hisatsugu Shirai

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392059

KEYWORDS: Etching, Chromium, Dry etching, Magnetism, Reticles, Thin films, Anisotropic etching, Reactive ion etching, Photoresist processing, Error control coding

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Proceedings Article | 19 July 2000 Paper

Knack for reticle cleaning

Masumi Takahashi, Hitoshi Handa, Hisatsugu Shirai

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392043

KEYWORDS: Reticles, Particles, Yield improvement, Contamination, Chromium, Very large scale integration, Mask making, Adsorption, Semiconductor manufacturing, Semiconducting wafers

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Proceedings Article | 30 December 1999 Paper

Dry etching technology of Cr films to produce fine-pattern reticles under 720 nm with ZEP-7000

Hitoshi Handa, Satoshi Yamauchi, Kouji Hosono, Yutaka Miyahara

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373299

KEYWORDS: Chromium, Etching, Dry etching, Reticles, Optical proximity correction, Photoresist processing, Binary data, Magnetism, Reactive ion etching, Tolerancing

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Proceedings Article | 28 July 1997 Paper

Cleaning technology of PSM for sub-quarter-micron devices

Hitoshi Handa, Masumi Takahashi, Yutaka Miyahara

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277298

KEYWORDS: Particles, Reticles, Transmittance, Quartz, Scanning probe microscopy, Etching, Optical properties, Inspection, Chemical reactions, Oxidation

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Showing 5 of 10 publications

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