Prof. Hong-suk Kim Profile

Prof. Hong-suk Kim

at Daejin Univ

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 25 January 2011 Paper

Human vision based color edge detection

Ari Kim, Hong-suk Kim, Seung-ok Park

Proceedings Volume 7866, 78660I (2011) https://doi.org/10.1117/12.877122

KEYWORDS: Color difference, Edge detection, RGB color model, Visualization, Human vision and color perception, Sensors, Image processing, Molybdenum, Digital imaging, Televisions

Read Abstract +

Proceedings Article | 25 January 2011 Paper

Brightness contrast under high surround luminance levels: psychophysical data vs CIECAM02

Ye Seul Baek, Ari Kim, Hong-suk Kim, Seung-ok Park

Proceedings Volume 7866, 78660X (2011) https://doi.org/10.1117/12.872590

KEYWORDS: Visualization, LCDs, Fiber optic illuminators, Data modeling, Visual process modeling, Data analysis, Physics, Manufacturing, Quantum wells, Color imaging

Read Abstract +

SPIE Journal Paper | 1 October 2010

Measurement of the optimum surround ratio inducing the highest perceived image contrast

Ye Seul Baek, Youn Jin Kim, Hong-suk Kim, Seung-ok Park

JEI, Vol. 19, Issue 04, 043013, (October 2010) https://doi.org/10.1117/12.10.1117/1.3506735

KEYWORDS: LCDs, Fiber optic illuminators, Digital imaging, Colorimetry, Lamps, Diffusers, Image quality, Statistical analysis, RGB color model, Physics

Read Abstract +

Proceedings Article | 8 November 2005 Paper

Characteristics of RIE lag and pattern density effect in alternating aperture phase-shift masks

Byung-Soo Chang, Yoon-Young Chang, Hyun-Suk Bang, In-Soo Lee, Lee-Ju Kim, Chang-Nam Ahn, Hong-Suk Kim

Proceedings Volume 5992, 59923Q (2005) https://doi.org/10.1117/12.632022

KEYWORDS: Etching, Reactive ion etching, Quartz, Critical dimension metrology, Ions, Photomasks, Diffractive optical elements, Plasma, Atomic force microscopy, Phase shifts

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)

Daniel Courboin, Jong Woo Choi, S. Jung, Seung Hee Baek, Lee-Ju Kim, Chang Nam Ahn, Hong-Seok Kim

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557708

KEYWORDS: Critical dimension metrology, Standards development, Photomasks, Lithography, Semiconducting wafers, Diffractive optical elements, Photoresist processing, Acoustics, Temperature metrology, Physics

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Investigation on micro-trench formation of alternating aperture phase shift masks

Sung-Won Kwon, Heong-Sup Jeong, Lee-Ju Kim, Chang-Nam Ahn, Hong-Seok Kim

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504175

KEYWORDS: Etching, Photomasks, Quartz, Fluorine, Surface roughness, Scanning electron microscopy, Ions, Atomic force microscopy, Phase shifts, Plasma systems

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Negative chemically amplified resist in making mask for a logic device with high pattern density

Kyung-Han Nam, Hyun-Joon Cho, Seung Hee Baek, Seong-Ho Jeong, Chang-Nam Ahn, Hong-Seok Kim

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504188

KEYWORDS: Photomasks, Etching, Logic devices, Line edge roughness, Mask making, Scanning electron microscopy, Photoresist processing, Resistance, Critical dimension metrology, Dry etching

Read Abstract +

Proceedings Article | 13 September 2002 Paper

Effect of brightness adjustment on the accuracy of color reproduction in CRT display

Hong Suk Kim, Seung Park

Proceedings Volume 4922, (2002) https://doi.org/10.1117/12.483129

KEYWORDS: CRTs, RGB color model, Color reproduction, Color difference, Sensors, Signal processing, Neodymium, Measurement devices, Photography, Amplifiers

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Fogging and pattern loading effect by writing strategy

Junsik Cho, Seung Hee Baek, Kyung-Han Nam, H. J. Cho, Daniel Courboin, Seong-Ho Jeong, In-Soo Lee, Cheol Shin, Hong-Seok Kim

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476943

KEYWORDS: Critical dimension metrology, Dry etching, Etching, Error analysis, Mask making, Photomasks, Optical proximity correction, Modulation, Logic devices, Scanning electron microscopy

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability

Jung-Bae Kim, I. Hur, Seong-Ho Jeong, Yong-Seok Son, Kyu-Yong Lee, Sang Lee, Cheol Shin, Hong-Seok Kim

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438361

KEYWORDS: Inspection, Transmittance, Light sources, Reticles, Defect detection, Photomasks, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Ultraviolet radiation

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Effect of clear field ratio on critical dimension in the dry etching process

Chul-Joong Lee, Hyun-Suk Bang, J. Choi, H. Jung, Cheol Shin, Hong-Seok Kim

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438357

KEYWORDS: Critical dimension metrology, Dry etching, Etching, Photomasks, Lithography, Standards development, Wet etching, Target detection, Mask making, Semiconducting wafers

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Enhanced capability improvement using OPC pattern generation at laser lithography

In-Soo Lee, Kyung-Han Nam, Lee-Ju Kim, Cheol Shin, Hong-Seok Kim

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438346

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Mask making, Etching, Cadmium, Image quality, Logic, Dry etching, Scanning electron microscopy

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Kyung-Han Nam, Lee-Ju Kim, Hyoung-Sup Jeong, Sang Lee, In-Soo Lee, Cheol Shin, Hong-Seok Kim, L. Dieu, Seung-Weon Paek, Sang-Sool Koo, Sang-Man Bae, Young-Mog Ham, Ki-Soo Shin

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438396

KEYWORDS: Photomasks, Lithography, Mask making, Semiconducting wafers, Phase shifts, Dry etching, Scanning electron microscopy, Electroluminescence, 193nm lithography, Photoresist processing

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Double-step process for manufacturing reticle to reduce gate CD variation

Makoto Kozuma, Masaya Komatsu, Rieko Arakawa, Seiji Kubo, Tatsuya Takahashi, John Jensen, Hyun-Suk Bang, Il-Ho Lee, Cheol Shin, Hong-Seok Kim, Keun-Won Park

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410759

KEYWORDS: Reticles, Critical dimension metrology, Logic, Image processing, Overlay metrology, Computer aided design, Manufacturing, Dry etching, Transistors, Etching

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Sang-Sool Koo, Hee-Bom Kim, Hyoung-Soon Yune, Jee-Suk Hong, Seung-Weon Paek, Tae-Seung Eom, Chang-Nam Ahn, Young-Mog Ham, Ki-Ho Baik, Kyu-Yong Lee, Lee-Ju Kim, Hong-Seok Kim

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410711

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Phase shifts, Electroluminescence, Optical lithography, Chromium, Etching, Mask making, Scanning electron microscopy

Read Abstract +

Proceedings Article | 19 July 2000 Paper

ArF halftone PSM cleaning process optimization for next-generation lithography

Yong-Seok Son, Seong-Ho Jeong, Jeong-Bae Kim, Hong-Seok Kim

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392044

KEYWORDS: Photomasks, Transmittance, Contamination, Ozone, Particles, Lithography, Control systems, Halftones, Coating, X-ray technology

Read Abstract +

Proceedings Article | 19 July 2000 Paper

Improvement of defect density for DUV halftone PSM

Kyu-Yong Lee, Lee-Ju Kim, Kyeong-Mee Yeon, Sang Lee, Hong-Seok Kim

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392039

KEYWORDS: Etching, Chemistry, Photomasks, Phase shifts, Inspection, Chromium, Plasma systems, Dry etching, Plasma etching, Deep ultraviolet

Read Abstract +

Proceedings Article | 19 July 2000 Paper

Effective OPC pattern generation using chemically amplified resist for 0.13-um design rule masks

Il-Ho Lee, Kyung-Han Nam, Hong-Seok Kim

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392083

KEYWORDS: Optical proximity correction, Scattering, Photomasks, Head, Quartz, Dry etching, Backscatter, Lithium, Chemically amplified resists, Scanning electron microscopy

Read Abstract +

Showing 5 of 18 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years