Mr. Honggang Gu Profile

Honggang Gu

at Huazhong Univ of Science and Technology

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Author

Publications (8)

Proceedings Article | 18 December 2023 Paper

Self-adaptive noise minimization for diffractive imaging via regularized regression

Chuangchuang Chen, Honggang Gu, Shiyuan Liui

Proceedings Volume 12963, 129630B (2023) https://doi.org/10.1117/12.3003704

KEYWORDS: Signal to noise ratio, Diffraction, Background noise, Interference (communication), Denoising, Analog to digital converters, Analog electronics, Photons, Electrons, Education and training

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Proceedings Article | 23 January 2023 Paper

High throughput defect inspection and ptychographic review for EUV mask

Chuangchuang Chen, Yu Zhou, Wenjie Li, Li Liu, Honggang Gu, Shiyuan Liu

Proceedings Volume 12557, 125571G (2023) https://doi.org/10.1117/12.2651662

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Defect inspection, Extreme ultraviolet lithography, Sensors, Scattering, Transistors, Image retrieval

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We have recently developed an actinic full-field EUV patterned mask inspection and review system on a tabletop by using a coherent high-harmonic generation (HHG) Extreme Ultra-violet (EUV) source. By adopting a combination of reflective-mode fly-scan scattering detecting and scanning coherent diffraction imaging methods, the actinic defects can be sensitively detected with high throughput and precisely reviewed with a finer resolution. In this work, we propose a model of a two-step EUV mask cross-scale inspection (EMCI) tactic for fast identification of actinic defects and high-resolution review of the EUV mask, which is based on difference analysis of diffracted intensities and precise ptychographic reconstruction of the EUV mask. The proposed EMCI model consists of two steps. In the first step, a fly-scan diffraction difference mapping (FDDM) method is applied to recognize and localize the defects from the EUV mask with full field of view. Thus, a sub-micron resolution defect location map is generated by array to array comparison of the diffracted intensities from the line integral of scanning regions with programmed defects, to regions of defect-free. This FDDM method works particularly in Fourier domain with no need to any form of imaging system, meanwhile, scattering information takes the advantage of high sensitivity to nanoscale defects, so that defects can be recognized and localized with high throughput and robustness. In the second step, with the location information of defects by FDDM, an EUV Ptychography (EUVP) method is applied to do the local review of EUV mask by retrieving the image of both the EUV mask and illumination based on ptychography. In this manuscript, utilizing the proposed EMCI model, we have performed a numerical simulation for EUV patterned mask defect inspection and review. The results reveal the performance of the proposed model in EUV mask metrology. The proposed method is particularly expected to have a remarkable implication for the EUV lithography.

Proceedings Article | 7 March 2019 Paper

Characterization of a liquid crystal variable retarder by Mueller matrix ellipsometry

Peng Wei, Honggang Gu, Xiuguo Chen, Hao Jiang, Chuanwei Zhang, Shiyuan Liu

Proceedings Volume 11053, 110531Q (2019) https://doi.org/10.1117/12.2511431

KEYWORDS: Liquid crystals, Polarization, Wave plates, Molecules, Spectroscopy, Ellipsometry, Modulation

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Proceedings Article | 15 March 2016 Paper

Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system

Honggang Gu, Hao Jiang, Chuanwei Zhang, Xiuguo Chen, Shiyuan Liu

Proceedings Volume 9780, 97801M (2016) https://doi.org/10.1117/12.2219139

KEYWORDS: Wave plates, Polarimetry, Immersion lithography, Algorithms, Lithography, Polarization, Magnesium fluoride, Process control, Diagnostics, Lithographic illumination, Sapphire, Refractive index, Geometrical optics

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Proceedings Article | 21 June 2015 Paper

Correction of depolarization effect in Mueller matrix ellipsometry with polar decomposition method

Weiqi Li, Chuanwei Zhang, Hao Jiang, Xiuguo Chen, Honggang Gu, Shiyuan Liu

Proceedings Volume 9526, 952619 (2015) https://doi.org/10.1117/12.2184786

KEYWORDS: Matrices, Silicon, Wave plates, Nanostructures, Mueller matrices, Metrology, Ellipsometry, Scanning electron microscopy, Sensors, Prototyping

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Proceedings Article | 21 June 2015 Paper

Measurement errors induced by axis tilt of biplates in dual-rotating compensator Mueller matrix ellipsometers

Honggang Gu, Chuanwei Zhang, Hao Jiang, Xiuguo Chen, Weiqi Li, Shiyuan Liu

Proceedings Volume 9526, 952617 (2015) https://doi.org/10.1117/12.2184772

KEYWORDS: Polarization, Magnesium fluoride, Calibration, Crystals, Optical components, Error analysis, Wave plates, Geometrical optics, Wave propagation, Prototyping

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Proceedings Article | 10 October 2013 Paper

Correction on the effect of numerical aperture in optical scatterometry

Weiqi Li, Shiyuan Liu, Chuanwei Zhang, Xiuguo Chen, Honggang Gu

Proceedings Volume 8916, 89162I (2013) https://doi.org/10.1117/12.2035546

KEYWORDS: Metrology, Scatterometry, Photoresist materials, Mueller matrices, Optics manufacturing, Data modeling, Scanning electron microscopy, Statistical modeling, Polarimetry, Silicon

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Proceedings Article | 31 January 2013 Paper

Analysis and extraction of misalignment errors in a three-in-one composite wave-plate with an equivalent fast axis

Honggang Gu, Shiyuan Liu, Xiuguo Chen, Chuanwei Zhang

Proceedings Volume 8759, 87593C (2013) https://doi.org/10.1117/12.2014580

KEYWORDS: Composites, Error analysis, Alignment procedures, Mathematical modeling, Wave plates, Optical components, Inverse problems, Spectroscopes, Spectroscopy, Optical alignment

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Showing 5 of 8 publications

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