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Hsuan-Chen Chen
at Taiwan Semiconductor Manufacturing Company
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Publications (1)
Proceedings Article | 10 May 2016 Paper
Investigation and modeling of CPL mask profiles using OCD
Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, Anthony Yen
Proceedings Volume 9984, 998408 (2016) https://doi.org/10.1117/12.2245332
KEYWORDS: Photomasks, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Lithography, Metrology, Modeling, Phase shifts
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