Dr. Irene Su Profile

Dr. Irene Su

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 12 April 2013 Paper

Mask compensation for process flare in 193nm very low k1 lithography

Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas

Proceedings Volume 8683, 86830F (2013) https://doi.org/10.1117/12.2012463

KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Transistors, Critical dimension metrology, Model-based design, 193nm lithography, Cadmium, Photomasks, Optical lithography

Read Abstract +

Proceedings Article | 8 April 2011 Paper

Shadowing effect modeling and compensation for EUV lithography

Hua Song, Lena Zavyalova, Irene Su, James Shiely, Thomas Schmoeller

Proceedings Volume 7969, 79691O (2011) https://doi.org/10.1117/12.881713

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reticles, Optical lithography, Lithography, Critical dimension metrology, Calibration, Semiconducting wafers, Cadmium

Read Abstract +

Proceedings Article | 23 March 2010 Paper

EUV modeling accuracy and integration requirements for the 16nm node

Lena Zavyalova, Irene Su, Stephen Jang, Jonathan Cobb, Brian Ward, Jacob Sorensen, Hua Song, Weimin Gao, Kevin Lucas, Gian Lorusso, Eric Hendrickx

Proceedings Volume 7636, 763627 (2010) https://doi.org/10.1117/12.848290

KEYWORDS: Extreme ultraviolet, Optical proximity correction, Photomasks, Calibration, Optical lithography, Data modeling, Extreme ultraviolet lithography, Point spread functions, Reticles, 3D modeling

Read Abstract +

Proceedings Article | 10 March 2010 Paper

A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC

Yongfa Fan, Moon-Gyu Jeongb, Junghoon Ser, Sung-Woo Lee, Chunsuk Suh, Kyo-Il Koo, Sooryong Lee, Irene Su, Lena Zavyalova, Brad Falch, Jason Huang, Thomas Schmoeller

Proceedings Volume 7640, 764039 (2010) https://doi.org/10.1117/12.846737

KEYWORDS: Data modeling, Process modeling, Diffusion, Optical proximity correction, Semiconducting wafers, Calibration, Photoresist processing, Fiber optic illuminators, Chemically amplified resists, Molecules

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Impact of scanner signatures on optical proximity correction

Jacek Tyminski, Tomoyuki Matsuyama, Yen-Liang Lu, Jun-Cheng Lai, Kao-Tun Chen, Yung-Ching Mai, Irene Su, George Bailey

Proceedings Volume 7640, 76400V (2010) https://doi.org/10.1117/12.845061

KEYWORDS: Optical proximity correction, Scanners, Photomasks, Fiber optic illuminators, Cadmium, Integrated circuits, Metrology, Tolerancing, Integrated optics, Diffraction

Read Abstract +

Proceedings Article | 30 September 2009 Paper

Wafer topography proximity effect modeling and correction for implant layer patterning

Hua Song, James Shiely, Irene Su, Lin Zhang, Wen-Kang Lei

Proceedings Volume 7488, 74883F (2009) https://doi.org/10.1117/12.829725

KEYWORDS: Semiconducting wafers, Optical proximity correction, Photomasks, Optical lithography, Cadmium, Critical dimension metrology, Calibration, Photoresist materials, Lithography, Reflection

Read Abstract +

Proceedings Article | 26 March 2007 Paper

The calibration of process window model for 55-nm node

Te Hung Wu, Sheng Yuan Huang, Chia Wei Huang, Pei Ru Tsai, Chuen Huei Yang, Irene Yi-Ju Su, Brad Falch

Proceedings Volume 6520, 65203A (2007) https://doi.org/10.1117/12.715496

KEYWORDS: Semiconducting wafers, Data modeling, Process modeling, Calibration, Optical proximity correction, Finite element methods, Sensors, Lithography, Tolerancing

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Novel methodology for photo condition optimization through simulation

Irene Su, Rachel Huang, Ta-Hung Yang, Kevin Tu, Smith Peng, Chih-Yuan Lu

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533422

KEYWORDS: Profiling, Photomasks, Composites, Data modeling, Optimization (mathematics), Statistical methods, Lithography, Semiconducting wafers, Diffractive optical elements, Statistical analysis

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years