Mr. Jacob Dobson Profile

Jacob Dobson

at TEL Technology Ctr America LLC

SPIE Involvement:

Author

Publications (2)

SPIE Journal Paper | 22 November 2024

Sub-20-nm tip-to-tip enabled by anti-spacer patterning

Jodi Grzeskowiak, Michael Murphy, David Power, Steven Grzeskowiak, Jacob Dobson, Andrew Weloth, Charlotte Cutler, Eric Liu, David Conklin, Anton Devilliers

JM3, Vol. 24, Issue 01, 011004, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011004

Read Abstract +

Proceedings Article | 10 April 2024 Presentation

Breaching high-NA EUV dimensions with 193i anti-spacer multipatterning

Michael Murphy, Jacob Dobson, Jodi Grzeskowiak, David Power, Charlotte Cutler, Andrew Weloth, David Conklin

Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447

KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years