Dr. Jae-Hak Choi Profile

Dr. Jae-Hak Choi

Professor at Chungnam National Univ

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Author

Publications (10)

Proceedings Article | 26 September 2013 Paper

The cause of irregular shape of the photonic crystal fabricated with recycled solvent

Jae-Hak Choi, Kwang-Sun Kang

Proceedings Volume 8816, 88160D (2013) https://doi.org/10.1117/12.2023822

KEYWORDS: Optical spheres, Silica, Photonic crystals, FT-IR spectroscopy, Absorption, Manufacturing, Water, Scanning electron microscopy, Electron microscopes, Renewable energy

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Proceedings Article | 12 April 2007 Paper

Patterning of biomolecules on a biocompatible nonchemically amplified resist

Jin-Baek Kim, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, Sang Yup Lee

Proceedings Volume 6519, 65191L (2007) https://doi.org/10.1117/12.712102

KEYWORDS: Ultraviolet radiation, Optical lithography, Lithography, Polymers, Chemistry, Proteins, Photoresist processing, Glasses, Photoresist materials, Tissue engineering

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Proceedings Article | 4 May 2005 Paper

Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography

Ramakrishnan Ganesan, Jae-Hak Choi, Hyo-Jin Yun, Young-Gil Kwon, Kyoung-Seon Kim, Tae-Hwan Oh, Jin-Baek Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599622

KEYWORDS: Lithography, Silicon, Ultraviolet radiation, Absorbance, Standards development, Polymers, Semiconducting wafers, Sodium, Photomicroscopy, Solids

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Proceedings Article | 14 May 2004 Paper

Water-developable resists based on glyceryl methacrylate for 193-nm lithography

Jin-Baek Kim, Ji-Hyun Jang, Jae-Hak Choi, Kwan-Ku Lee, Jong-Sung Ko

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534533

KEYWORDS: Polymers, Lithography, Resistance, Silicon, Etching, Polymerization, Semiconducting wafers, Silicon films, Lamps, Printing

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Proceedings Article | 12 June 2003 Paper

Nonshrinkable photoresists for ArF lithography

Jin-Baek Kim, Tae Hwan Oh, Jae-Hak Choi, Jae-Jun Lee

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485074

KEYWORDS: Polymers, Sodium, Photoresist materials, Lithography, Carbon, Chromatography, Silica, Chemically amplified resists, Spectroscopy, Oxidation

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Proceedings Article | 30 July 2002 Paper

Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Byeong-Ho Cho, Donggyu Yim, Chan-Ha Park, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, Khil-Ohk Kang, Sang-Wook Kim, Tae-Hwa Yu, Jong-Kyun Hong, Jung-Chan Kim, Min-Seob Han, Ho-Young Heo, Young-Dae Kim, Dong-Duk Lee, Gyu-Han Yoon, Jan van Schoot, Thomas Theeuwes, Young-Hong Min

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474633

KEYWORDS: Diffraction, Lithography, Monochromatic aberrations, Optical lithography, Fourier transforms, Control systems, Phase shifts, Spatial frequencies, Scanners, Photomasks

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Proceedings Article | 24 July 2002 Paper

Novel molecular resists based on inclusion complex of cyclodextrin

Jin-Baek Kim, Young-Gil Kwon, Hyo-Jin Yun, Jae-Hak Choi

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474286

KEYWORDS: Molecules, Polymers, Resistance, Photoresist materials, Solids, Silicon, Lithography, Semiconducting wafers, Silicon films, Etching

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Proceedings Article | 14 September 2001 Paper

Optimum field-size strategy for DRAM mass production in low-k1 process

Chan-Ha Park, Donggyu Yim, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, Khil-Ohk Kang, Sang-Wook Kim, Dong-Duk Lee, Gyu-Han Yoon

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435634

KEYWORDS: Semiconducting wafers, Scanners, Photomasks, Critical dimension metrology, Lithography, Chemical mechanical planarization, Electroluminescence, Tolerancing, Process modeling, Etching

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Proceedings Article | 23 June 2000 Paper

Characteristic study of electron beam stabilization for deep-UV photoresists

Myoung-Soo Kim, Jae-Hak Choi, Chi Rho, Min-Jong Hong, Bum-Jin Jun, Myung-Goon Gil, Bong-Ho Kim, Dong-Jun Ahn, Matthew Ross, Selmer Wong

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388365

KEYWORDS: Electron beams, Etching, Deep ultraviolet, Photoresist processing, Photoresist materials, Refraction, Semiconducting wafers, Metals, FT-IR spectroscopy, Chemical analysis

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Proceedings Article | 11 June 1999 Paper

Acid diffusion and evaporation in chemically amplified resists

Jin-Baek Kim, Young-Gil Kwon, Jae-Hak Choi, Min-Ho Jung

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350236

KEYWORDS: Diffusion, Polymers, Chemically amplified resists, Semiconducting wafers, Silicon, Absorbance, Deep ultraviolet, Optical filters, Chemistry, Molecules

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Showing 5 of 10 publications

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