Dr. Jae Yong Lee Profile

Dr. Jae Yong Lee

at Korea Research Institute of Standards and Science

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 27 May 2022 Open Access

Time-of-flight measurement-based three-dimensional profiler system employing a lightweight Fresnel-type Risley prism scanner

Jae Heun Woo, Chu-Shik Kang, Jong-Ahn Kim, Jae Wan Kim, Sunghoon Eom, Jae Yong Lee

OE, Vol. 61, Issue 05, 054104, (May 2022) https://doi.org/10.1117/12.10.1117/1.OE.61.5.054104

KEYWORDS: 3D metrology, Prisms, 3D scanning, 3D acquisition, Laser scanners, Clouds, Scanners, Distortion, Optical engineering, 3D-TOF imaging

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 9 March 2016 Paper

Single-pulse coherent anti-Stokes Raman spectroscopy via fiber Bragg grating

Seung Ryeol Oh, Joo Hyun Park, Won Sik Kwon, Jin Hwan Kim, Kyung-Soo Kim, Jae Yong Lee, Soohyun Kim

Proceedings Volume 9740, 97400E (2016) https://doi.org/10.1117/12.2209734

KEYWORDS: Raman spectroscopy, Fiber Bragg gratings, Pulsed laser operation, Fiber lasers, Femtosecond phenomena, Nonlinear optics, Optical filters, Pulse shaping, Spectroscopy, Microscopy

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture

Yongwoo Kim, Seok Kim, Howon Jung, Jinhee Jang, Jae Yong Lee, Jae Hahn

Proceedings Volume 8323, 832320 (2012) https://doi.org/10.1117/12.916237

KEYWORDS: Nondestructive evaluation, Photoresist materials, Near field, Lithography, Plasmonics, Process modeling, Finite-difference time-domain method, Photoresist developing, Near field scanning optical microscopy, 3D modeling

Read Abstract +

In plasmonic nano lithography, a photoresist responds to the localized electric field which decays evanescently in the direction of depth. A simple analytic model is suggested to predict profiles of exposed and finally developed pattern with a finite contrast of photoresist. In this model, the developing process is revisited by accounting the variation of dissolution rate with respect to expose dose distribution. We introduce the concept of nominal developing thickness (NDT) to determine the optimized developing process fitting to the isointensity profile. Based on this model, we obtained three dimensional distribution of near-field of bowtie shaped plasmonic nano aperture in a metal film from the near-field lithography pattern profile. For the near-field exposure, we fabricated a nano aperture in a aluminum metal film which is coated on the contact probe tip. By illuminating 405 nm diode laser source, the positive type photoresist is exposed by the localized electric field produced by nano aperture. The exposed photoresist is developed by the TMAH based solution with a optimum NDT, which leads the developing march encounters the isoexposure contour at threshold dose. From the measurement of developed pattern profile with a atomic force microscope (AFM), the three-dimensional isoexposure (or iso-intensity) surface at the very near region from the exit plane of an aperture (depth: 5 ~ 50 nm) is profiled. Using the threshold dose of photoresist and exposure time, the absolute intensity level is also measured. The experimental results are quantitatively compared with the calculation of FDTD (finite- difference time-domain) method. Concerning with the error in exposure time and threshold dose value, the error in measurement of profile and intensity are less than 6% and 1%, respectively. We expect the lithography model described in this presentation allows more elaborated expectation of developed pattern profile. Furthermore, a methodology of mapping is useful for the quantitative analysis of near-field distribution of nano-scale optical devices.

SPIE Journal Paper | 1 March 2007 Open Access

Nonlinear optical interference of two successive coherent anti-Stokes Raman scattering signals for biological imaging applications

Eunseong Lee, Jae Lee, Yong Yoo

JBO, Vol. 12, Issue 02, 024010, (March 2007) https://doi.org/10.1117/12.10.1117/1.2718560

KEYWORDS: Interferometry, Glasses, CARS tomography, Image quality, Objectives, Oscillators, Skin, Nonlinear optics, Raman spectroscopy, Raster graphics

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 14 August 2006 Paper

Nonlinear interference of two successive coherent anti-Stokes Raman scattering signals for the biological imaging applications

Eun Seong Lee, Jae Yong Lee, Yong Shim Yoo

Proceedings Volume 6292, 62921L (2006) https://doi.org/10.1117/12.681497

KEYWORDS: Glasses, Interferometry, CARS tomography, Image quality, Phase shifting, Beam splitters, Mirrors, Objectives, Pulsed laser operation, Raster graphics

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years