Mr. Jaeyeol Baek Profile

Jaeyeol Baek

at SAMSUNG SDI Co Ltd

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Proceedings Article | 27 March 2017 Paper

Study of flowability effect on self-planarization performance at SOC materials

Huichan Yun, Jinhyung Kim, Youjung Park, Yoona Kim, Seulgi Jeong, Jaeyeol Baek, Byeri Yoon, Sanghak Lim

Proceedings Volume 10146, 1014624 (2017) https://doi.org/10.1117/12.2257880

KEYWORDS: System on a chip, Carbon, Double patterning technology, Polymers, Etching, Resistance, Fourier transforms, Optical lithography, Optical properties, Coating

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For multilayer process, importance of carbon-based spin-on hardmask material that replaces amorphous carbon layer (ACL) is ever increasing. Carbon-based spin-on hardmask is an organic polymer with high carbon content formulated in organic solvents for spin-coating application that is cured through baking. In comparison to CVD process for ACL, carbon-based spin-on hardmask material can offer several benefits: lower cost of ownership (CoO) and improved process time, as well as better gap-fill and planarization performances. Thus carbon-based spin-on hardmask material of high etch resistance, good gap-fill properties and global planarization performances over various pattern topographies are desired to achieve the fine patterning and high aspect ratio (A/R). In particular, good level of global planarization of spin coated layer over the underlying pattern topographies is important for self-aligned double patterning (SADP) process as it dictates the photolithographic margin. Herein, we report a copolymer carbon-based spin-on hardmask resin formulation that exhibits favorable film shrinkage profile and good etch resistance properties. By combining the favorable characteristics of each resin – one resin with good shrinkage property and the other with excellent etch resistance into the copolymer, it was possible to achieve a carbonbased spin-on hardmask formulation with desirable level of etch resistance and the planarization performances across various underlying substrate pattern topographies.

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