Dr. Jaw-Jung Shin Profile

Dr. Jaw-Jung Shin

Section Manager at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 19 March 2015 Paper

Contour-based kernel modeling and verification for E-Beam lithography

Jan-Wen You, Cheng-Hung Chen, Tsung-Chih Chien, Jaw-Jung Shin, Shy-Jay Lin, Burn Lin

Proceedings Volume 9423, 94231D (2015) https://doi.org/10.1117/12.2085099

KEYWORDS: Scattering, Electron beam lithography, Laser scattering, Optimization (mathematics), Photomasks, Systems modeling, Backscatter, Critical dimension metrology, Point spread functions, Feature extraction

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Proceedings Article | 28 March 2014 Paper

The REBL DPG: recent innovations and remaining challenges

Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin

Proceedings Volume 9049, 904917 (2014) https://doi.org/10.1117/12.2048528

KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

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Proceedings Article | 28 March 2014 Paper

REBL DPG lenslet structure: design for charging prevention

Shy-Jay Lin, T. Bao, C. Lu, S.-C. Wang, T. C. Chien, J.-J. Shin, Burn Lin, Mark McCord, Alan Brodie, Allen Carroll, Luca Grella

Proceedings Volume 9049, 90491X (2014) https://doi.org/10.1117/12.2045416

KEYWORDS: Dielectrics, Electrodes, Electron beam lithography, Microelectromechanical systems, Atomic layer deposition, Lens design, Structural design, Coating, Reflectivity, Electron beams

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Proceedings Article | 26 March 2013 Paper

Influence of data volume and EPC on process window in massively parallel e-beam direct write

Shy-Jay Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Jaw-Jung Shin , Burn Jeng Lin, Mark McCord, Sameet Shriyan

Proceedings Volume 8680, 86801C (2013) https://doi.org/10.1117/12.2010865

KEYWORDS: Electroluminescence, Raster graphics, Scattering, Monte Carlo methods, Silica, Diffusion, Laser scattering, Quantization, Modulation transfer functions, Backscatter

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Proceedings Article | 4 April 2011 Paper

Influence of massively parallel e-beam direct-write pixel size on electron proximity correction

S. J. Lin, P. S. Chen, J. J. Shin, W. C. Wang, Burn Lin

Proceedings Volume 7970, 79700Z (2011) https://doi.org/10.1117/12.869896

KEYWORDS: Raster graphics, Critical dimension metrology, Semiconducting wafers, Data transmission, Electron beam lithography, Tolerancing, Optical fibers, Maskless lithography, Electron beam direct write lithography, Mask making

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Proceedings Article | 6 December 2004 Paper

Phase-defocus windows for alternating phase shifting mask

Fu-Jye Liang, Chun-Kuang Chen, Jaw-Jung Shin, Jan-Wen You, Chun-Heng Lin, Zhin-Yu Pan, King-Chang Shu, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569216

KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making

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Proceedings Article | 20 August 2004 Paper

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Shuo-Yen Chou, Jaw-Jung Shin, King-Chang Shu, Jan-Wen You, Lin-Hung Shiu, Bin-Chang Chang, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557745

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Laser energy, Image processing, Electron beam lithography, Semiconducting wafers, Optical simulations, Optical proximity correction, Convolution

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Proceedings Article | 28 May 2004 Paper

General scaling law of optical lithography: optical theory

Chun-Kuang Chen, Tsai-Sheng Gau, Li-Jui Chen, Chi-Chuang Lee, Jaw-Jung Shin, Anthony Yen, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536667

KEYWORDS: Optical lithography, Optics manufacturing, Manufacturing

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SPIE Journal Paper | 1 April 2004

Mask error tensor and causality of mask error enhancement for low-k₁ imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn-Sheng Yu, Anthony Yen, Burn-Jeng Lin

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669508

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Error analysis, Scanners, Diffraction, Solids, Lithography, Electroluminescence

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Proceedings Article | 28 August 2003 Paper

Mask cost and cycle time reduction

Hong-Chang Hsieh, Johnson Hung, Angus Chin, Sheng-Cha Lee, Jaw-Jung Shin, Ru-Gun Liu, Burn Lin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504288

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Semiconducting wafers, Defect inspection, Lithography, Critical dimension metrology, Mask making, Manufacturing, Vestigial sideband modulation

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Proceedings Article | 28 August 2003 Paper

Pattern-dependence optical phase effect on alternating phase shift mask

Bin-Chang Chang, Jan-Wen You, Ming Lu, Chiu-Lien Lee, Li-Wei Kung, King-Chang Shu, Jaw-Jung Shin, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504284

KEYWORDS: Photomasks, Quartz, Etching, Chromium, Phase shifts, Wet etching, Reactive ion etching, Semiconducting wafers, Mask making, Resolution enhancement technologies

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Proceedings Article | 27 December 2002 Paper

Alt-PSM of contact with phase-assist feature for 65-nm node

Jan-Wen You, Jaw-Jung Shin, Chung-Hsing Chang, Li-Wei Kung, Bin-Chang Chang, Chang-Min Dai, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467499

KEYWORDS: Photomasks, Resolution enhancement technologies, Etching, Wet etching, Optical lithography, Dry etching, Semiconducting wafers, Chromium, Reticles, Phase shifts

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Proceedings Article | 1 August 2002 Paper

Pattern recognition in the database of a mask layout

Shih-Ying Chen, Eric Lynn, Jaw-Jung Shin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476935

KEYWORDS: Pattern recognition, Genetic algorithms, Fuzzy logic, Detection and tracking algorithms, Optical proximity correction, Databases, Photomasks, Semiconducting wafers, Algorithm development, Visualization

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Proceedings Article | 30 July 2002 Paper

Model-based OPC for 0.13-um contacts using 248-nm Att PSM

Jaw-Jung Shin, T. Wu, Chun-Kuang Chen, R. Liu, Yao Ching Ku, Burn Lin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474511

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Model-based design, Semiconducting wafers, Cadmium, Data modeling, Logic, Lithography, Phase shifts

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Proceedings Article | 30 July 2002 Paper

Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn Sheng Yu, Anthony Yen, Burn Lin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474574

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Mask making, Lithography, Tolerancing, Scanners, Optical lithography, Error analysis, Semiconductor manufacturing

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