Dr. Jie Li Profile
Dr. Jie Li
at Onto Innovation Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960F (2023) https://doi.org/10.1117/12.2658148
KEYWORDS: Education and training, Semiconducting wafers, Overlay metrology, Critical dimension metrology, Mueller matrices, 3D metrology, Data modeling, 3D modeling, Machine learning, Spectral response

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111P (2021) https://doi.org/10.1117/12.2583774
KEYWORDS: Metrology, Machine learning, Signal processing, Semiconductors, Data modeling, Time metrology, Data processing

Proceedings Article | 22 February 2021 Presentation + Paper
Matthew Wormington, Adam Ginsburg, Israel Reichental, Alex Dikopoltsev, Alex Krokhmal, Yuri Vinshtein, Paul Ryan, Rahul Korlahalli, Franklin Wong, Silvio Rabello, Yang Song, Jie Li
Proceedings Volume 11611, 116110W (2021) https://doi.org/10.1117/12.2583966
KEYWORDS: X-rays, Semiconductors, Critical dimension metrology, Semiconducting wafers, Metrology, X-ray characterization, Scattering, Etching, Capacitors, 3D metrology

SPIE Journal Paper | 16 October 2014
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour
Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu
Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165
KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

Proceedings Article | 10 April 2013 Paper
Hock-Chun Chin, Moh-Lung Ling, Bin Liu, Xingui Zhang, Jie Li, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo
Proceedings Volume 8681, 86813D (2013) https://doi.org/10.1117/12.2013413
KEYWORDS: Germanium, Scatterometry, Transmission electron microscopy, Scanning electron microscopy, Transistors, Metrology, Etching, Front end of line, 3D modeling

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86810T (2013) https://doi.org/10.1117/12.2012120
KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86810S (2013) https://doi.org/10.1117/12.2011675
KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, 3D metrology, Neodymium, Spectroscopic ellipsometry, Lithography

Proceedings Article | 6 April 2012 Paper
Jie Li, Asher Tan, JinWoo Jung, Gary Goelzer, Nigel Smith, Jiangtao Hu, Boo-Hyun Ham, Min-Cheol Kwak, Cheol-Hong Kim, Suk-Woo Nam
Proceedings Volume 8324, 83243A (2012) https://doi.org/10.1117/12.918706
KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

Proceedings Article | 5 April 2012 Paper
Proceedings Volume 8324, 83241I (2012) https://doi.org/10.1117/12.916747
KEYWORDS: Semiconducting wafers, Overlay metrology, 3D acquisition, 3D metrology, Finite element methods, Diffraction gratings, Time metrology, Spectroscopy, Reflectance spectroscopy, 3D modeling

Proceedings Article | 5 April 2012 Paper
Proceedings Volume 8324, 83240M (2012) https://doi.org/10.1117/12.916006
KEYWORDS: Scatterometry, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Metrology, Semiconducting wafers, Double patterning technology, Cadmium, Optical lithography, Ellipsometry

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 797111 (2011) https://doi.org/10.1117/12.879900
KEYWORDS: Scatterometry, Critical dimension metrology, Semiconducting wafers, Metrology, Double patterning technology, Etching, Process control, Scatter measurement, Reflectometry, Scanning electron microscopy

Proceedings Article | 20 April 2011 Paper
Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Ulrich Weher, Catherine Volkman, Martin Mazur, Jiangtao Hu
Proceedings Volume 7971, 79711Y (2011) https://doi.org/10.1117/12.879552
KEYWORDS: Overlay metrology, Double patterning technology, Reflectance spectroscopy, Detection and tracking algorithms, Time metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Spectroscopy, Reflectometry

SPIE Journal Paper | 1 October 2010
JM3, Vol. 9, Issue 04, 041305, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514708
KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76382C (2010) https://doi.org/10.1117/12.848516
KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

Proceedings Article | 2 April 2010 Paper
Prasad Dasari, Nigel Smith, Gary Goelzer, Zhuan Liu, Jie Li, Asher Tan, Chin Hwee Koh
Proceedings Volume 7638, 76381P (2010) https://doi.org/10.1117/12.848189
KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Error analysis, Data modeling, Reflectometry, Process control, Spectroscopy, Diffraction gratings, Carbon

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75201B (2009) https://doi.org/10.1117/12.839821
KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Lithography, Scatter measurement, Critical dimension metrology, Spectroscopic ellipsometry, Photoresist processing, Calibration, Metrology

Proceedings Article | 24 March 2009 Paper
Prasad Dasari, Rahul Korlahalli, Jie Li, Nigel Smith, Oleg Kritsun, Cathy Volkman
Proceedings Volume 7272, 727212 (2009) https://doi.org/10.1117/12.816590
KEYWORDS: Overlay metrology, Double patterning technology, Optical lithography, Data modeling, Metrology, Semiconducting wafers, Scatterometry, Spectroscopy, Lithography, Etching

Proceedings Article | 23 March 2009 Paper
Jie Li, Zhuan Liu, Silvio Rabello, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Jungchul Park, Lovejeet Singh
Proceedings Volume 7272, 727207 (2009) https://doi.org/10.1117/12.814706
KEYWORDS: Overlay metrology, Critical dimension metrology, Semiconducting wafers, Scatterometry, Double patterning technology, Error analysis, Reflectivity, Metrology, Cadmium, Diffraction gratings

Proceedings Article | 20 March 2009 Paper
Proceedings Volume 7271, 727121 (2009) https://doi.org/10.1117/12.816545
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Scatterometry, Extreme ultraviolet, Reticles, Overlay metrology, Metrology, Diffraction gratings

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727415 (2009) https://doi.org/10.1117/12.814955
KEYWORDS: Data modeling, 3D modeling, Scatterometry, Calibration, Optical proximity correction, 3D metrology, Critical dimension metrology, Lithography, Line edge roughness, Cadmium

Showing 5 of 22 publications
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