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Jifeng Miao
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Publications (1)
Proceedings Article | 10 December 2024 Paper
An effective methodology of filter, measure, and align SEM image in model calibration
Proceedings Volume 13423, 134230D (2024) https://doi.org/10.1117/12.3052591
KEYWORDS: Scanning electron microscopy, Image filtering, Semiconducting wafers, Tunable filters, Optical alignment, Optical proximity correction, Process modeling, Contour modeling, Image processing, Calibration
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