Dr. Jin-Goo Park Profile

Dr. Jin-Goo Park

at Hanyang Univ

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 1 December 2022 Paper

Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure

Dong-Hyeon Kwon, Hyun-Gyu Kang, Tae-Gon Kim, Jin-Ho Ahn, Sang-Sul Lee, Jin-Goo Park

Proceedings Volume 12293, 122930B (2022) https://doi.org/10.1117/12.2641800

KEYWORDS: Particles, Tin, Lead, Ruthenium, Extreme ultraviolet lithography, Silicon, Atomic force microscopy, Extreme ultraviolet

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Proceedings Article | 16 November 2022 Presentation

Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Proceedings Volume PC12293, PC1229308 (2022) https://doi.org/10.1117/12.2641583

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Safety, Particle systems, Particle contamination, Atomic force microscopy, Silica, Optical microscopes, Nanomanipulation

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SPIE Journal Paper | 12 October 2017

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041008, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041008

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

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Proceedings Article | 24 March 2017 Paper

Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 10143, 101431V (2017) https://doi.org/10.1117/12.2258189

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Silicon carbide

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Proceedings Article | 26 September 2016 Paper

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9985, 99850G (2016) https://doi.org/10.1117/12.2242999

KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

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SPIE Journal Paper | 7 October 2015

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-ho Ahn, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 14, Issue 04, 043501, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043501

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

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Proceedings Article | 9 July 2015 Paper

Patterning dependence on the mask defect for extreme ultraviolet lithography

Hye-Rim Ji, In-Seon Kim, Guk-Jin Kim, Jin-Goo Park, Min-Su Kim, Micheal Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 965813 (2015) https://doi.org/10.1117/12.2197751

KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

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Proceedings Article | 19 March 2015 Paper

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-Ho Ahn, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9422, 94221O (2015) https://doi.org/10.1117/12.2086052

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Semiconducting wafers, Radiation effects, Photomasks, Deep ultraviolet, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Proceedings Article | 25 September 2010 Paper

Damage/organic free ozonated DI water cleaning on EUVL Ru capping layer

Seung-ho Lee, Bong-kyun Kang, Hyuk-min Kim, Min-soo Kim, Han-ku Cho, Chan-uk Jeon, Hyung-ho Ko, Han-shin Lee, Jin-ho Ahn, Jin-Goo Park

Proceedings Volume 7823, 78232Z (2010) https://doi.org/10.1117/12.878895

KEYWORDS: Ruthenium, Ozone, Extreme ultraviolet lithography, Oxygen, Gases, Carbon dioxide, Carbon, Scanning probe microscopy, Lithography, Atomic force microscopy

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Proceedings Article | 18 November 2003 Paper

Nano-particle laser removal from silicon wafers

J. Lee, S. Cho, T. Kim, Jin-Goo Park, Ahmed Busnaina

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.541167

KEYWORDS: Particles, Semiconducting wafers, Plasma, Silicon, Silica, Chemical mechanical planarization, Atmospheric particles, Semiconductor lasers, Airborne laser technology, Visualization

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Proceedings Article | 19 February 2003 Paper

Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers

J. Lee, S. Cho, J. Park, S. Lee, Y. Han, S. Kim

Proceedings Volume 4830, (2003) https://doi.org/10.1117/12.486511

KEYWORDS: Particles, Semiconducting wafers, Chemical mechanical planarization, Silicon, Semiconductor lasers, Surface finishing, Silica, Plasma, Scanners, Metals

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Showing 5 of 11 publications

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