Dr. Jing Qin Profile

Dr. Jing Qin

at National Institute of Standards and Technology

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Author

Publications (5)

Proceedings Article | 23 September 2013 Paper

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Bryan Barnes, Jing Qin, Hui Zhou, Richard Silver

Proceedings Volume 8819, 88190E (2013) https://doi.org/10.1117/12.2027259

KEYWORDS: Microscopes, Polarization, Photodiodes, Scattering, Reflectivity, Microscopy, Objectives, Spatial frequencies, Charge-coupled devices, Sensors

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Proceedings Article | 11 October 2012 Paper

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Jing Qin, Hui Zhou, Bryan Barnes, Francois Goasmat, Ronald Dixson, Richard Silver

Proceedings Volume 8466, 84660G (2012) https://doi.org/10.1117/12.946120

KEYWORDS: Polarization, Critical dimension metrology, Microscopes, Optical imaging, Illumination engineering, Light scattering, Optical metrology, Microscopy, 3D acquisition, Scattering

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Proceedings Article | 5 April 2012 Paper

Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

Richard Silver, Jing Qin, Bryan Barnes, Hui Zhou, Ronald Dixson, Francois Goasmat

Proceedings Volume 8324, 83240N (2012) https://doi.org/10.1117/12.916988

KEYWORDS: 3D metrology, Optical metrology, Polarization, Light scattering, Statistical analysis, 3D image processing, Data acquisition, Metrology, Atomic force microscopy, Silicon

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Proceedings Article | 23 May 2011 Paper

A Bayesian statistical model for hybrid metrology to improve measurement accuracy

R. Silver, N. Zhang, B. Barnes, J. Qin, H. Zhou, R. Dixson

Proceedings Volume 8083, 808307 (2011) https://doi.org/10.1117/12.889876

KEYWORDS: Atomic force microscopy, Metrology, Statistical analysis, Data modeling, Reflectivity, Optical testing, Model-based design, 3D modeling, Oxides, Scanning electron microscopy

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Proceedings Article | 20 April 2011 Paper

Nested uncertainties and hybrid metrology to improve measurement accuracy

R. Silver, N. F. Zhang, B. Barnes, H. Zhou, J. Qin, R. Dixson

Proceedings Volume 7971, 797116 (2011) https://doi.org/10.1117/12.882411

KEYWORDS: Atomic force microscopy, Metrology, Reflectivity, Data modeling, 3D modeling, Optical testing, Model-based design, Statistical analysis, Oxides, Scatter measurement

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