In this work, 532-nm high-reflection (HR) coatings have been deposited at different deposition temperatures by electron-beam evaporation technology. The spectral performance, e-field distribution, surface roughness, stoichiometry, as well as the laser resistance of the prepared 532-nm HR coatings are investigated. Experimental results indicate that the LIDT of the 532-nm HR coatings can be greatly influenced by deposition temperature. A relatively high deposition temperature benefits the crystallization and oxidation, and improves the LIDT of the 532-nm HR coatings. In addition, the SiO2 overcoat layer is also demonstrated to be effective in suppressing the delamination damage morphology and improving the LIDT of the 532-nm HR coatings.
Fine control of Optical Thin Film Stress is critical to develop an expected profile parameters of large aperture
coated optics. In our latest effort, the evolution of stress and force per unit width of multilayer thin film formulas,
(H2L)6, (H2L)5H and (HL)7, consisted of HfO2 and SiO2 were researched. The stresses of SiO2 single layers deposited on
the HfO2 were small than those grew on glass and get smaller as the multilayer thin film deposited. While the stresses of
HfO2 films deposited on the SiO2 were positive correlation with the stress of SiO2.
Hafnium oxide/silicon dioxide (HfO2/SiO2) multilayers were prepared by electron-beam evaporation. The total force per
unit width (F/w) during and after deposition was determined by the change of the substrate curvature measured in situ.
Stress induced by water absorption is a major component of the film stress evolution in atmospheric environment.
Growth stress was analyzed to understand the role of the sublayers and the influence of the underlayers’ structural
features. The substrate material affects the stress evolutions in both HfO2 films and SiO2 films. The structural feature of
the HfO2 layer onto which SiO2 was deposited has a significant effect on the stress evolution of the SiO2 layer.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.