Mr. John M. Whittey Profile

John M. Whittey

Business Development Manager at Vistec Electron Beam GmbH.

SPIE Involvement:

Author

Area of Expertise:

Scanning Electron Microscopy , Metrology , Semiconductor equipment , E-beam Lithography , Photomasks , Wafer Fabs

Publications (16)

Proceedings Article | 8 November 2012 Paper

Photomask film degradation effects in the wafer fab: how to detect and monitor over time

John Whittey, Carl Hess, Edgardo Garcia, Mark Wagner, Brian Duffy

Proceedings Volume 8522, 85221D (2012) https://doi.org/10.1117/12.968166

KEYWORDS: Semiconducting wafers, Reticles, Photomasks, Inspection, Process control, Critical dimension metrology, Manufacturing, Signal processing, Metrology, Semiconductors

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Proceedings Article | 8 November 2012 Paper

Comparison of critical dimension measurements of a mask inspection system with a CD-SEM

Jan Heumann, Albrecht Ullrich, Clemens Utzny, Stefan Meusemann, Frank Kromer, John Whittey, Edgardo Garcia, Mark Wagner, Norbert Schmidt

Proceedings Volume 8522, 85220G (2012) https://doi.org/10.1117/12.977248

KEYWORDS: Critical dimension metrology, Photomasks, Inspection, Semiconducting wafers, Scanning electron microscopy, Optical testing, Electron microscopes, Opacity, Manufacturing, Wafer manufacturing

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Proceedings Article | 2 April 2010 Paper

In-depth overlay contribution analysis of a poly-layer reticle

Frank Laske, J. Whittey, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. Berglund, M. Takac, Seurien Chou

Proceedings Volume 7638, 76382E (2010) https://doi.org/10.1117/12.848343

KEYWORDS: Reticles, Error analysis, Photomasks, Image registration, Metrology, Overlay metrology, Semiconducting wafers, Manufacturing, Spatial frequencies, Data analysis

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Proceedings Article | 23 September 2009 Paper

Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks

J. Whittey, F. Laske, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. N. Berglund, M. Takac, Seurien Chou

Proceedings Volume 7488, 74881I (2009) https://doi.org/10.1117/12.833495

KEYWORDS: Reticles, Error analysis, Photomasks, Image registration, Metrology, Manufacturing, Semiconducting wafers, Statistical analysis, Data analysis, Calibration

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Proceedings Article | 23 September 2009 Paper

Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address double patterning lithography challenges

Klaus-Dieter Roeth, Frank Laske, Michael Heiden, Dieter Adam, Lidia Parisoli, Slawomir Czerkas, John Whittey, Karl-Heinrich Schmidt

Proceedings Volume 7488, 74881M (2009) https://doi.org/10.1117/12.833203

KEYWORDS: Metrology, Photomasks, Double patterning technology, Reticles, Deep ultraviolet, Pellicles, Laser development, Lithographic illumination, Lithography, Image registration

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Proceedings Article | 20 October 2006 Paper

A new algorithm for SEM critical dimension measurements for differentiating between lines and spaces in dense line/space patterns without tone dependence

J. Matsumoto, Y. Ogiso, M. Sekine, T. Iwai, J. Whittey

Proceedings Volume 6349, 634941 (2006) https://doi.org/10.1117/12.686143

KEYWORDS: Scanning electron microscopy, Optical alignment, Detection and tracking algorithms, Critical dimension metrology, Photomasks, Pattern recognition, Algorithm development, Reflectivity, Beam shaping, Optical simulations

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Proceedings Article | 6 December 2004 Paper

Reticle CD-SEM for 65-nm technology node and beyond

Gerhard Schlueter, Takayuki Nakamura, Jun Matsumoto, Masahiro Seyama, John Whittey

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568270

KEYWORDS: Contamination, Photomasks, Scanning electron microscopy, Critical dimension metrology, Opacity, Reticles, Manufacturing, Microsystems, Electron beams, Metrology

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Proceedings Article | 2 June 2004 Paper

Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system

John Whittey, Walter Steinberg

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568019

KEYWORDS: Photomasks, Ultraviolet radiation, Critical dimension metrology, Deep ultraviolet, Microsystems, Etching, Manufacturing, Inspection, Optical testing, Integrated circuits

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Proceedings Article | 27 December 2002 Paper

Back to square 9: a demonstration of 9-in. reticle capablilty

Kevin Cummings, Ludger Schneider-Stoermann, Ute Buttgereit, Mathias Irmscher, Dietmar Mueller, Peter Hudek, Dirk Beyer, Bernd Brendel, John Whittey, Benjamin Eynon, Jason Harsch, Chris Constantine, Kirk Miller

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467495

KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Semiconducting wafers, Standards development, Scanning electron microscopy, Lithography, Metrology, Manufacturing, Chromium

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Proceedings Article | 11 March 2002 Paper

First performance data obtained on next-generation mask metrology tool

Gerhard Schlueter, Klaus-Dieter Roeth, John Whittey

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458296

KEYWORDS: Metrology, Optical testing, Photomasks, Microsystems, Time metrology, Fiber optics tests, Fiber optics, Wafer-level optics, Tolerancing, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Gerhard Schlueter, Walter Steinberg, John Whittey

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458314

KEYWORDS: Deep ultraviolet, Critical dimension metrology, Optical resolution, Objectives, Reticles, Optical testing, Ultraviolet radiation, Lens design, Electronics, Microsystems

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Proceedings Article | 18 December 1998 Paper

Stage Cartesian self-calibration: a second method

Michael Takac, John Whittey

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332853

KEYWORDS: Calibration, Metrology, Photomasks, Lithography, Optical lithography, Interferometers, Inspection, Yield improvement, Photomask technology, Manufacturing

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Proceedings Article | 18 December 1998 Paper

LWM 200 CD metrology tool evaluation

Robert Uitz, John Whittey

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332821

KEYWORDS: Tolerancing, Metrology, Critical dimension metrology, Time metrology, Laser systems engineering, Vibration isolation, Cadmium, Microsystems, Human-machine interfaces, Reliability

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Proceedings Article | 27 December 1996 Paper

Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, John Whittey

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262819

KEYWORDS: Metrology, Photomasks, Overlay metrology, Edge detection, Semiconducting wafers, Laser systems engineering, CCD cameras, Image analysis, Reticles, Interferometers

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Proceedings Article | 15 February 1994 Paper

Improvements in two-dimensional X/Y metrology on photomasks and wafers

John Whittey

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167258

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photomask technology, Quartz, Phase shifts, Reflectivity, Performance modeling, Telecommunications, Environmental sensing

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Proceedings Article | 1 June 1990 Paper

Environmental effects on registration and accuracy data on quartz photomasks utilizing the LMS-2000 laser metrology system

Larry Land, John Whittey

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20072

KEYWORDS: Laser systems engineering, Temperature metrology, Metrology, Humidity, Photomasks, Laser metrology, Integrated circuits, Inspection, Process control, Control systems

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Showing 5 of 16 publications

Conference Committee Involvement (2)

Photomask Technology

15 September 2009 | Monterey, California, United States

Photomask Technology

7 October 2008 | Monterey, California, United States

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